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Laser direct writing device based on combined vortex double focusing light spot

A compound vortex and focusing spot technology, which is applied in the direction of photolithography exposure equipment, microlithography exposure equipment, etc., can solve the problems of reduced working wavelength and difficulty in aberration correction, so as to reduce stringent requirements and achieve lateral resolution , the effect of high horizontal resolution

Active Publication Date: 2014-10-22
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, as the working wavelength decreases, especially in the deep ultraviolet band, due to the lack of suitable optical materials, reflective optical path structure has to be adopted
The reflective optical path is extremely difficult for the aberration correction of the system

Method used

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  • Laser direct writing device based on combined vortex double focusing light spot
  • Laser direct writing device based on combined vortex double focusing light spot
  • Laser direct writing device based on combined vortex double focusing light spot

Examples

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Embodiment

[0036] Taking a focusing lens with NA=0.6 as an example, a specific implementation scheme of a double-lobe focusing spot laser direct writing system realized by a compound vortex is proposed below.

[0037] Here we choose NA=0.6, the incident aperture of the focusing lens is 6mm, and the aperture stop aperture on the rear focal plane of the objective lens is 6mm. The spatial light modulator is a Holoeye Pluto VIS (single pixel 8 μm, total pixel number is 1920×1080) working in pure phase modulation mode. The self-focusing servo drive 14 can be an axial piezoelectric ceramic nano drive with a linear range of 2 microns and a closed-loop resolution of 0.2 nm. The total number of compound vortex phase equal-area regions in formula (1) is selected as N=10. When the initial phase difference between adjacent ring areas is π, the phase distribution in the incident aperture of the focusing objective lens is as follows: figure 1 shown. The focal lengths of the first lens (801) and the...

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PUM

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Abstract

The invention discloses a laser direct writing device based on a combined vortex double focusing light spot. The laser direct writing device mainly comprises a 405 nm blue light etching light path, a 650 nm red light self-focusing servo light path, a control computer and a relevant control feedback system, wherein the 405 nm blue light etching light path mainly comprises a circular polarization lens group, a 1 / 2 wave plate, an electric control rotating platform, a spatial light modulator, a confocal lens group, a dichroism beam splitter, a focusing objective, a self-focusing servo driver, an electric control two-dimensional movement platform and the like; the 650 nm red light self-focusing servo light path mainly comprises a red light collecting lens, a cylindrical mirror and a four-quadrant detector. The laser direct writing device is characterized in that a combined vortex phase modulation is added in an entrance pupil of a conventional laser direct writing light loath focusing objective, thereby achieving double focusing light spot intensity distribution at an objective focusing rear field. The double focusing light spot is capable of achieving hundred-nanometer-order transverse resolution under the medium-numerical aperture focusing, and has a micrometer-order axial focal depth under the medium-numerical aperture focusing.

Description

technical field [0001] The invention relates to a laser direct writing device, in particular to a laser direct writing device based on a composite vortex double-lobe focusing spot. Background technique [0002] The three-dimensional spatial distribution of the focused light field of the objective lens can be said to be the core of the laser direct writing technology. We know that for a conventional optical system, its resolution R and depth of focus DOF ​​are closely related to the numerical aperture NA of the system imaging lens, that is, R∝λ / NA, and the depth of focus DOF∝λ / NA of the imaging system 2 . In the case of a certain wavelength, on the one hand, to improve the resolving power of laser direct writing, it is necessary to increase the numerical aperture NA of the system. However, an increase in numerical aperture means a sharp reduction in the depth of focus of the system. The sharp reduction of the depth of focus poses a severe test to the self-focusing servo sy...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 余俊杰周常河贾伟卢炎聪李树斌
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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