Optical antireflection film and preparation method thereof, and optical assembly
An optical anti-reflection coating and monomer technology, applied in the coating and other directions, can solve the problems of increasing the complexity and cost of the process, and not being cost-effective, and achieve the effect of improving light transmittance, easy control, and reducing refractive index
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[0100] In the specific example of the method for preparing an optical anti-reflection coating provided in one aspect of the present invention, preferably in the first step, hollow microparticles with a hollow structure such as silicon dioxide particles are added to the mixture to further increase the obtained The porosity of the optical anti-reflection coating can reduce the refractive index of the optical anti-reflection coating and improve the light transmission of the optical anti-reflection coating. Wherein, during the preparation process, the content of the hollow microparticles is equivalent to 1-7wt%, preferably 3-7wt%, of the total amount of the first and second monomers. In the prepared optical anti-reflection film, the content of the hollow fine particles is preferably 1-10 wt% of the dry weight of the film. If the content of the hollow fine particles is too small (less than 1wt%), it will not substantially improve the light transmittance of the anti-reflection coati...
Embodiment 1
[0106] Mix 2.72g of MTMS (purity 95%), 13.44g of hydrochloric acid (1mol / L), 15.64g of ethanol (purity 95%), stir at 60°C for 90 minutes; then slowly drop 0.54g of BTMSE ( Purity 98%) continue to stir for 30 minutes, and after standing for 10 minutes, a coating solution is formed for use. The above-mentioned coating solution was coated on the surface of a clean glass sheet by spin coating, and the thickness was controlled to be about 150 nm. Put the coated glass sheet into an oven at 120°C for 100 minutes for pre-curing, and then cure at 400°C for 15 minutes. Obtain an optical anti-reflection film with a thickness of 95nm.
Embodiment 2
[0110] Mix 1.36g of MTMS (purity 95%), 8.00g of sulfuric acid (0.5mol / L), 9.12g of isopropanol (purity 95%), and stir at 75°C for 45 minutes; then maintain the above temperature and slowly 0.54 g of BTMSE (purity 98%) was added dropwise and stirred for 80 minutes, and then left to stand for 15 minutes for use. The above-mentioned coating solution was coated on the surface of a clean glass sheet by the spin coating method, and the thickness was controlled to be about 200nm. Put the coated glass sheet into an oven at 100°C for pre-curing for 200 minutes, and then cure at 300°C for 45 minutes. Obtain an optical anti-reflection film with a thickness of 135nm.
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