Plasma switch for laser pulse shaping
A plasma and laser pulse technology, applied in the laser field, can solve the problems of low device repetition rate, complex device, low laser transmittance, etc., and achieve the effect of improving the repetition rate, high peak power, and high laser transmittance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0017] The specific embodiments of the present invention will be further described below in conjunction with the accompanying drawings. It should be noted here that the descriptions of these embodiments are used to help understand the present invention, but are not intended to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below may be combined with each other as long as they do not constitute a conflict with each other.
[0018] Such as figure 1 As shown, a plasma switch for laser pulse shaping provided by an example of the present invention includes a vacuum chamber 2 , a first lens 3 , a second lens 4 , a fan 5 and a heat exchanger 6 .
[0019] The first lens 3 and the second lens 4 are two identical ZnSe lenses.
[0020] The vacuum chamber 2 is provided with two facing observation windows for input and output of laser light. An optical platform is provided in the vacuum chamber 2 fo...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com