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Preparation method of vanadium dioxide nano rodlike thin film

A nano-rod-shaped, vanadium dioxide technology, applied in nanotechnology, electrolytic inorganic material coating and other directions, can solve the problems of difficult control of film thickness and uniform compactness, increase production costs, and accurately control parameters, etc. The effect of controllable thickness and simple process

Inactive Publication Date: 2014-02-05
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, many related preparation methods and processes have been developed, such as Chinese patent CN101700909, Chinese patent CN101391814, etc., using hydrothermal method to prepare vanadium dioxide. The preparation conditions are relatively harsh, the reaction cycle is long, and the film thickness and uniform density are not easy to control due to the limitation of the film formation process.
Chinese patent CN101280413A and Chinese patent CN101265036A both use the method of magnetron sputtering to deposit vanadium dioxide film directly on the glass substrate at low temperature. High, not only increases the production cost, but also requires precise control of parameters, which is not conducive to mass production and limits its popularization and application

Method used

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  • Preparation method of vanadium dioxide nano rodlike thin film
  • Preparation method of vanadium dioxide nano rodlike thin film
  • Preparation method of vanadium dioxide nano rodlike thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] 1. Mix ethanol and deionized water evenly at a volume ratio of 1:1, dissolve vanadyl sulfate in it, and make a 0.2mol / L electrolyte;

[0030] 2. Add an appropriate amount of dispersant, stir for 15 minutes, and ultrasonically disperse for 20 minutes to obtain a blue clear solution;

[0031] 3. Add acid and alkali dropwise to adjust the pH value of the above solution to 2.5-2.7;

[0032] 4. Wash and dry the SnO2 transparent conductive glass (FTO) substrate doped with fluorine through appropriate amount of ethanol, acetone, hydrochloric acid and deionized water in sequence;

[0033] 5. Put the above-mentioned substrate and electrodes into the electrolyte in parallel at a distance of 2 cm, apply a DC voltage of 1.3 V, and power on for 20 minutes to perform electrochemical deposition coating;

[0034] 6. After the deposition, the product was dried at 80°C for 30 minutes, and then annealed at 500°C for 12 hours in an N2 atmosphere to obtain a brown film.

[0035] The XRD s...

Embodiment 2

[0038] Steps 1-4 are the same as in Example 1, the voltage in step 5 is 1.4V, the power-on time is 20min, and the annealing temperature in step 6 is 500°C.

[0039] The morphology of the vanadium dioxide nanorod film obtained in this example is consistent with that described in Example 1.

Embodiment 3

[0041] Steps 1-4 are the same as in Example 1, the voltage in step 5 is 1.3V, the power-on time is 60min, and the annealing temperature in step 6 is 500°C.

[0042] The morphology of the vanadium dioxide nanorod film obtained in this example is consistent with that described in Example 1.

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Abstract

The invention discloses a preparation method of a vanadium dioxide nano rodlike thin film. The preparation method of the vanadium dioxide nano rodlike thin film comprises the following steps: firstly preparing clarified electrolyte containing a tetravalent compound, then carrying out electrochemical deposition coating; finally annealing at the temperature of 100-800 DEG C in a reducing atmosphere. The thin film obtained by adopting the preparation method is of a nano rodlike structure with a regular and uniform morphology, has high surface activity, can be applied to a thin film material which is formed through deposition on the surface of a base plate in one step and has thermochromic property and also can be applied to the fields of energy storage materials like a cathode electrode; besides, the preparation method of the vanadium dioxide nano rodlike thin film is simple in technology, mild in reaction conditions and applicable to substrate base plates with different morphologies and specifications, a film-forming speed is high, morphology and thickness of the thin film are controllable, compactness is good, and the preparation method of the vanadium dioxide nano rodlike thin film is applicable to large-scale popularization and application.

Description

technical field [0001] The invention relates to a method for preparing a vanadium dioxide nanorod film, in particular to a vanadium dioxide film with a nanorod structure prepared by an electrochemical deposition method, and belongs to the technical field of inorganic functional materials. Background technique [0002] Vanadium dioxide is a typical thermally induced phase change material. Among the discovered phase change materials, its phase transition temperature is 68°C, which is the closest to room temperature. When it is lower than this temperature, it changes from monoclinic structure to rutile Structural transformation, thus showing a semiconductor phase, its resistivity, magnetic susceptibility and transmittance to infrared light are high; when the temperature is higher than the phase transition temperature, it presents a metal phase, its resistivity, magnetic susceptibility and infrared light transmittance The transmittance will be reduced, reflecting the obvious cha...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D9/04B82Y40/00
Inventor 李永祥屈钰琦刘志甫孙大志
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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