Cleaning method for dust-free duster

Abstract

The invention provides a novel cleaning method for a dust-free duster, which comprises the following steps: soaking the duster in ultrapure water being subjected to filtration of ion-exchange resin, adding fatty alcohol polyglycol ether, alkyl-triglyceride-amide and sulfosuccinic acid solution, and meanwhile, conducting fabric refining and acid-base cleaning, drying and cooling, and dust-free detection. The cleaning method is the cleaning process summarized by years of innovative practice research of the company; according to the dust-free duster cleaned by the method, pollutants of organic and inorganic residues, liquid dust particles, zwitterions, and the like are almost cleared completely, so that dust-free cleaning requirements for dusters in various fields of semiconductor product line chips, microprocessors, semiconductor assembly product lines, disc drivers, LCD display products, dust-free workplaces, and the like are completely satisfied; therefore, the method belongs to an innovation for the technical field of cleaning and processing of the dust-free dusters.

Description

technical field [0001] The invention relates to the technical field of cleaning, in particular to a cleaning method for a dust-free rag. Background technique [0002] In the prior art, the dust-free rag has a soft surface, is easy to wipe sensitive surfaces, does not lose fibers when rubbed, has good water absorption and cleaning effect, and is widely used in the following fields: semiconductor production line chips, microprocessors, semiconductor assembly production lines, discs Drivers, LCD display products, circuit board production lines, precision instruments, optical products, aviation industry, PCB products, medical equipment, dust-free workshops and many other fields. However, in the production process of the dust-free cloth, it is unavoidable to be polluted by silicone oil and ions, dust particles, organic matter, and inorganic residues. This kind of cleaning cannot completely clean the dust-free rag, especially the oil, pollution residue, liquid dust particles, ani...

AI Technical Summary

Problems solved by technology

However, in the production process of the dust-free cloth, it is unavoidable to be polluted by silicone oil and ions, dust particles, organic matter, and inorganic residues. This kind of cleaning cannot completely clean the dust-free rag, especially the oil, pollution residue, liquid dust particles, anion and cation and other pollutants, resulting in low cleanliness, poor dust adsorption capacity and antistatic properties of the produced rag. The effect is poor, and it cannot meet the purity requirements of semiconductor chips, microprocessors, LCD displays, circuit board production, precision instruments, dust-free workshops, etc., especially the water used for most cleaning is ordinary well water, river water or tap water. Well water, river water or tap water contains a lot of ions and impurities, which will also cause cross-contamination of dust-free rags during washing and refining

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