Backside off-axis alignment system, photolithography device and method based on array photoelectric sensor
A photoelectric sensor and alignment system technology, applied in the field of integrated circuit equipment manufacturing, to achieve the effects of reducing alignment errors, easy detection, and reducing the range of motion
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[0025] The back off-axis alignment system, lithography apparatus and method of a specific embodiment of the present invention will be described in detail below with reference to the accompanying drawings. However, it should be understood that the present invention is not limited to the embodiment described below, and the technical idea of the present invention can be implemented in combination with other known technologies or other technologies having the same functions as those known technologies.
[0026] In the following description, in order to clearly show the structure and working mode of the present invention, many directional words will be used for description, but the words "front", "rear", "left", "right", "outer", "inner" should be used. "", "outward", "inward", "上", "下" and other words are understood as convenient terms and should not be understood as restrictive terms. In addition, the term "X-direction" used in the following description mainly refers to the horizo...
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