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Radiation-sensitive composition, cured film, and method for forming same

A radiation-sensitive and compositional technology, which is applied in photosensitive material processing, instruments, optics, etc., can solve the problems that it is difficult to fully meet the required characteristics and uses of protective films or interlayer insulating films.

Active Publication Date: 2016-04-13
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, spacers for display elements are used differently from protective films or interlayer insulating films, so it is difficult to fully satisfy all required characteristics for protective films or interlayer insulating films

Method used

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  • Radiation-sensitive composition, cured film, and method for forming same
  • Radiation-sensitive composition, cured film, and method for forming same
  • Radiation-sensitive composition, cured film, and method for forming same

Examples

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example

[0344] Although the synthesis examples and examples are shown below and the present invention will be described more specifically, the present invention is not limited to the following examples.

[0345] The weight average molecular weight (Mw) and the number average molecular weight (Mn) of the polysiloxane obtained by each synthesis example below were measured by the gel permeation chromatography (Gel Permeation Chromatography, GPC) of the following specification.

[0346] Device: GPC-101 (manufactured by Showa Denko Co., Ltd.)

[0347] Column: connect GPC-KF-801, GPC-KF-802, GPC-KF-803 and GPC-KF-804 (manufactured by Showa Denko Co., Ltd.)

[0348] Mobile Phase: Tetrahydrofuran

[0349] Synthesis example of polysiloxane of component [A]

Synthetic example 1

[0351] Add 20 parts by mass of propylene glycol monomethyl ether to a container with a stirrer, then add 41 parts by mass of methyltrimethoxysilane (hereinafter referred to as "MTMS"), 12 parts by mass of tetraethoxysilane (TEOS) and 3- (Trimethoxysilyl)propyl succinic anhydride (hereinafter referred to as "TMSPS") 5 parts by mass (MTMS / TEOS / TMSPS (molar ratio) = 80 / 15 / 5), heated until the solution temperature reached 60°C. After the solution temperature reached 60° C., 0.1 parts by mass of phosphoric acid and 19 parts by mass of ion-exchanged water were added, heated to 75° C., and kept for 3 hours. After cooling to 45 degreeC, 28 mass parts of methyl orthoformates were added as a dehydrating agent, and it stirred for 1 hour. Furthermore, the temperature of the solution was adjusted to 40° C., and the solution was evaporated while maintaining the temperature, thereby removing ion-exchanged water and methanol generated by hydrolytic condensation. Polysiloxane (A-1) was obtain...

Synthetic example 2

[0353]In addition to MTMS, TEOS, and TMSPS, 3-methacryloxypropyltrimethoxysilane (hereinafter referred to as "MPTMS") is further mixed with MTMS / TEOS / MPTMS / TMSPS (molar ratio) = 68 / 15 / 15 The polysiloxane (A-2) was obtained by the operation similar to the synthesis example 1 except having used in the ratio of / 2. The polysiloxane (A-2) had a solid content concentration of 30% by mass, a weight average molecular weight (Mw) of 2,300, and a degree of dispersion (Mw / Mn) of 2.1.

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Abstract

Provided is a radiation-sensitive composition, which is capable of forming a cured film that has a good balance among the characteristics required for protective films or interlayer insulating films at a high level, and which can be developed with an inorganic alkali developer solution. This radiation-sensitive composition contains the following components [A1], [B] and [C]. [A1] A polysiloxane which is obtained by subjecting tetraethoxysilane or a partial hydrolysis product thereof, a hydrolyzable silane compound represented by formula (1) or a partial hydrolysis product thereof, and a hydrolyzable silane compound represented by formula (2) or a partial hydrolysis product thereof to hydrolysis-condensation [B] A compound which has two or more ethylenically unsaturated groups (excluding the component [A1]) [C] A radical photopolymerization initiator In formulae (1) and (2), each of R1 and R3 represents an alkyl group having 1-6 carbon atoms; R2 represents an alkyl group having 1-20 carbon atoms, or the like; m represents an integer of 1-3; n represents an integer of 0-6; x represents an integer of 1-3; y represents an integer of 1-6; and z represents an integer of 0-3.

Description

technical field [0001] The present invention relates to a radiation-sensitive composition suitable as a material for forming a protective film or an interlayer insulating film of a display element, a cured film formed from the radiation-sensitive composition, and a method for forming the same. Background technique [0002] In liquid crystal display elements, integrated circuit elements, solid-state imaging elements, organic electroluminescence (Electroluminescence, EL) and other display elements, there are devices for preventing deterioration or damage of electronic components represented by touch panels. A cured film such as a protective film or an interlayer insulating film for maintaining insulation between wirings arranged in layers. In order to form such a cured film, a radiation-sensitive composition has been used. For example, a coating film of a radiation-sensitive composition can be formed on a substrate, and radiation is irradiated through a photomask having a pred...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/075C08F290/14C08G77/14C08G77/20
CPCC08F283/122C08G77/12C08G77/14C08L83/06G03F7/027G03F7/033G03F7/0757G03F7/40C08L83/00C08G77/20G03F7/075
Inventor 铃木康伸本田晃久奥田务上田二朗
Owner JSR CORPORATIOON
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