Device and method for measuring optical parameters of dielectric thin film

Abstract

The invention discloses a measurement device and a measurement method of optical parameters of a dielectric film. The measurement device comprises a sample platform assembly for placing a sample, a refractive index and thickness measurement assembly, a transmissivity and refractive index measurement assembly and a controller, wherein the refractive index and thickness measurement assembly is formed by a laser light source assembly, a polarizer, a semi-permeability and semi-reflection mirror, a circular hole diaphragm, an automatic-collimation detector and a measurement detector; and the transmissivity and refractive index measurement assembly is formed by a white-light light source, a collimation lens set which is connected with the white-light light source and is used for a collimation light path, an integrating sphere which is used for collecting light transmitted or reflected by the sample placed on the sample platform assembly, and a spectrograph connected with the integrating sphere. The measurement device disclosed by the invention has the advantages that the refractive index and thickness measurement assembly can measure the reflective index and the thickness of the sample, and the transmissivity and refractive index measurement assembly can measure the transmissivity and the refractive index of the sample, so that the measurement of various optical parameters is realized and the measurement precision is high.

Description

technical field [0001] The invention relates to an optical measurement technology, in particular to a measurement device and a measurement method for the optical parameters of a dielectric thin film. Background technique [0002] As early as 1817, Fraunhofer used acid etching to make anti-reflection coatings on optical lenses. After more than a century of development, by 1930, due to the emergence of vacuum evaporation equipment, various dielectric films began to be widely used in the optical field. Especially in recent decades, with the continuous emergence and vigorous development of new technologies such as microelectronic devices, optoelectronic devices, and biosensor devices, dielectric thin film technology is not only widely used in traditional optical engineering fields, but also more and more widely used It is used in different fields such as microelectronics technology, communication engineering, biological engineering, aerospace engineering, and medical engineerin...

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Problems solved by technology

At the same time, people have also designed corresponding measuring instruments for the optical parameters of dielectric films, such as spectrophotometers, ellipsometers, Abbe refractometers, etc. However, most of these measuring instruments have a single function

Among them, the spectrophotometer can accurately measure the transmittance and reflectance of the dielectric film, but cannot measure the refractive index and thickness of the dielectric film; the ellipsometer can accurately measure the thickness, refractive index and absorption coefficient of the dielectric film, and its measurement accuracy is high , but the measurement process is complicated and expensive; although the Abbe refractometer has the advantages of simple structure and convenient operation, it can only be used to measure liquids with a refractive index ranging from 1.3000 to 1.7000

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