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Post-treatment method for reducing ultraviolet optical loss of aluminum oxide film

A technology of alumina and ultraviolet light, which is applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problems of low cost, large optical loss of aluminum oxide film, high efficiency, etc., and achieves fast speed and good time Stability and environmental stability, high efficiency effect

Inactive Publication Date: 2013-09-04
SATURN OPTOELECTRONICS LAB
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problem of large optical loss of aluminum oxide film in the ultraviolet band in the prior art, the present invention provides a treatment method for reducing the ultraviolet optical loss of aluminum oxide film; relatively high deposition temperature is adopted to obtain high packing density , using post-coating annealing treatment technology to reduce the high optical loss caused by high deposition temperature, can significantly reduce the ultraviolet optical loss of aluminum oxide film, and has the characteristics of high efficiency and low cost

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] In the ZZS-630 vacuum physical vapor deposition coating system, the aluminum oxide film is deposited by electron beam thermal evaporation. The base material used is JGS1 fused silica, and the purity of alumina material is 99.99%. Before coating, the substrate was placed in petroleum ether for ultrasonic cleaning. The background vacuum degree of the coating process is 6.5×10 -4 Pa, the baking temperature is 350°C. The thickness of the film is monitored by the crystal control method.

[0019] The prepared aluminum oxide film was annealed in a muffle furnace at an annealing temperature of 300°C. During the annealing, the temperature was raised and lowered stepwise, with 50°C as the temperature rise step. The gas in the annealing furnace was air. During the temperature rise stage, the sample was from Heating starts at room temperature, and keeps for 5 minutes after each temperature point is reached, then continues to heat up until the final set temperature, and then keep...

Embodiment 2

[0022] In the ZZS-630 vacuum physical vapor deposition coating system, the aluminum oxide film is deposited by electron beam thermal evaporation. The base material used is JGS1 fused silica, and the purity of alumina material is 99.99%. Before coating, the substrate was placed in petroleum ether for ultrasonic cleaning. The background vacuum degree of the coating process is 6×10 -4 Pa, the baking temperature is 320°C. The thickness of the film is monitored by the crystal control method.

[0023] The prepared aluminum oxide film was annealed in a muffle furnace at an annealing temperature of 200°C. During the annealing, the temperature was raised and lowered stepwise, with 50°C as the temperature rise step. The gas in the annealing furnace was air. Start heating, and keep for 5 minutes after each temperature point is reached, then continue to heat up until the final set temperature, and then keep warm for 5 hours. In the cooling stage, the heating furnace is turned off to l...

Embodiment 3

[0026] In the ZZS-630 vacuum physical vapor deposition coating system, the aluminum oxide film is deposited by electron beam thermal evaporation. The base material used is JGS1 fused silica, and the purity of alumina material is 99.99%. Before coating, the substrate was placed in petroleum ether for ultrasonic cleaning. The background vacuum degree of the coating process is 5.5×10 -4 Pa, the baking temperature is 300°C. The thickness of the film is monitored by the crystal control method.

[0027] The prepared aluminum oxide film was annealed at an annealing temperature of 400°C in a muffle furnace. During annealing, a stepwise heating and cooling method was adopted, with 50°C as the heating step. The gas in the annealing furnace was air. During the heating stage, the sample was heated from room temperature Start heating, and keep for 5 minutes after each temperature point is reached, then continue to heat up until the final set temperature, and then keep warm for 5 hours. ...

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Abstract

The invention discloses a post-treatment method for reducing ultraviolet optical loss of an aluminum oxide film. The post-treatment method comprises the following steps of: 1), a substrate is placed in petroleum ether for ultrasonic cleaning, and then placed in a vacuum chamber, the film is deposited with aluminum oxide by an electron beam heat evaporation method at 300-350 DEG C, the purity of aluminum oxide is more than 99.99%, the background vacuum degree is greater than or equal to 5*10<-4>Pa, and the working vacuum degree is 4*10<-3>-6*10<-3>Pa; and 2), a coated sample is subjected to annealing treatment, an annealing technique adopts a stepped temperature rise and temperature drop mode, that is in a temperature rise period, the sample is heated from the room temperature at a rate of 50 DEG C, each temperature spot is reached and then kept for 5min till the final set temperature, and then the temperature is kept for 5h; in a temperature drop period, a heating furnace is shut down and cooled naturally, the annealing temperature is 200-400 DEG C, and the holding time is 5h. Equipment is simple, the speed and efficiency are high, multiple films can be treated simultaneously, the ultraviolet optical loss of the aluminum oxide film is reduced effectively, and the optical stability of the aluminum oxide film is improved.

Description

technical field [0001] The invention relates to the technical field of material processing, in particular to a post-processing method for reducing the ultraviolet optical loss of an aluminum oxide film. Background technique [0002] The semiconductor industry and laser material processing mainly use high-quality high-energy optical components in the ultraviolet band, especially the extreme ultraviolet-vacuum ultraviolet band. Optimizing the performance of thin-film components in the ultraviolet band is one of the key technologies for high-performance optical components. In the ultraviolet band or even in the band below 200nm, alumina material is widely used as the most commonly used high refractive index material. The optical properties of aluminum oxide thin films strongly depend on other factors such as coating process conditions and impurity pollution. In the prior art, there is a problem of large optical loss of aluminum oxide thin films; in order to obtain a thin film ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/58
Inventor 陶春先姜守振冯德军黄庆婕宋磊季伟
Owner SATURN OPTOELECTRONICS LAB
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