Novel acidic molybdenum aluminum molybdenum etching liquid and its preparation process

Abstract

The invention discloses a novel acidic molybdenum aluminum molybdenum etching liquid and its preparation process. The novel acidic molybdenum aluminum molybdenum etching liquid comprises phosphoric acid, acetic acid, nitric acid, metal nitrate, a cationic surfactant and pure water. The preparation process of the etching liquid includes: maintaining the rotation speed of an ingredient tank stirrer, adding the phosphoric acid, the acetic acid, the nitric acid, potassium nitrate, the pure water and the cationic surfactant sequentially into the ingredient tank, fully stirring them, then introducing the mixture into a filter to conduct filtration, thus obtaining the molybdenum aluminum molybdenum etching liquid. The molybdenum aluminum molybdenum etching liquid provided in the invention has a small particle size and high purity, has a basically consistent etching rate on different metals, and is stable in reaction. By adjusting the nitric acid concentration, the etching speed can be controllable. The substrate etched by the etching liquid has a clean and tidy surface, no residue, and no intermetallic layering phenomenon. The remaining lines are smooth, and the etching angle is maintained at 40-60 degrees.

Description

technical field [0001] The invention relates to a composition for chemical etching of metal materials and a preparation process thereof, in particular to a novel acidic molybdenum-aluminum-molybdenum etching solution and a preparation process. Background technique [0002] Etching is the technique of removing material using chemical reaction or physical impact. Etching technology is divided into wet etching and dry etching, wherein wet etching uses chemical reagents to achieve the purpose of etching through chemical reactions. Molybdenum-aluminum-molybdenum etching solution in the prior art is acidic, mainly made by phosphoric acid, nitric acid and acetic acid through stirring and mixing and filtering, and above-mentioned etching solution has been widely used in thin film field effect transistor liquid crystal display (TFT-LCD), light-emitting diode (LED ), organic light-emitting diode (OLED) and other industries are used in the etching of molybdenum layer and aluminum laye...

AI Technical Summary

Problems solved by technology

However, in the process of etching molybdenum-aluminum-molybdenum materials with reagents, it is often difficult to control the etching angle and the etching amount of different metal layers, which affects the yield of products

[0003] In recent years, while people's demand for liquid crystal displays has been increasing, higher requirements have been placed on product quality and screen accuracy, and the effect of etching can directly lead to the quality of the circuit board manufacturing process and affect the quality of high-density thin wires. Image Accuracy and Quality