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Exhaust gas recovery system

A tail gas recovery and tail gas technology, used in ammonia preparation/separation, lighting and heating equipment, liquefaction, etc., can solve problems such as waste and underutilization of liquid nitrogen cooling capacity, reduce the risk of deflagration, and save supporting facilities Facility cost and operating cost, effect of reducing consumption

Active Publication Date: 2016-03-09
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the heat absorbed by liquid nitrogen gasification mainly comes from the surrounding air, and the liquid nitrogen stations including liquid nitrogen storage tanks and vaporizers are all built outdoors, so the cooling capacity that liquid nitrogen can provide during the gasification process has not been obtained. Fully utilized, but also caused a lot of waste
[0005] In addition, a large amount of heat will be generated in the process of producing LEDs by MOCVD, and a special cooling system is required to provide cooling water at an appropriate temperature for MOCVD equipment, resulting in a large power consumption

Method used

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  • Exhaust gas recovery system
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Effect test

Embodiment 1

[0051] The tail gas recovery system of this embodiment is used to treat the tail gas generated by the tail gas pipe 30 of the MOCVD equipment. The tail gas can be separated, recovered or reused. Since nitrogen group elements are commonly used as the deposition gas source in MOCVD, the common tail gas components are mainly ammonia, doped with a certain amount of nitrogen and hydrogen. In this embodiment, the structure and operation method of this tail gas recovery system are introduced by taking the above tail gas components as an example.

[0052] Such as figure 1 As shown, the exhaust gas recovery system includes:

[0053] (1) Heat-absorbing fluid output terminal 10: commonly used heat-absorbing fluids can be liquid ammonia, liquid nitrogen, water or air; various heat-absorbing fluids can be adjusted depending on the actual process.

[0054] (2) The first compression device 20: it includes a compressor C1, a valve G and a pressure gauge P matched to the compressor C1. The...

Embodiment 2

[0069] Compared with Embodiment 1, the tail gas recovery system of this embodiment has improved the structure of each NWHE, and increased the insulation channel 43, such as image 3 Shown:

[0070] The tail gas passage 41 and the heat absorption passage 42 of each NWHE are covered with a heat preservation passage 43, so that the heat absorption passage 42 is completely submerged in a heat preservation passage 43 filled with heat preservation liquid. The heat preservation channel 43 can be a pipeline completely covering the heat absorption channel 42 , or a box. It is also provided with an inlet 43A and an outlet 43B for the circulation of the heat preservation liquid, and the heat preservation channel entrance 43A located at the beginning end NWHE of the first heat exchange group 40 is connected to the heat preservation fluid output end 50 to accommodate a higher temperature heat preservation fluid; two adjacent heat preservation The passages 43 are connected end-to-end throu...

Embodiment 3

[0081] In this embodiment, the first compression device 20 of Embodiment 2 is added on the basis of the tail gas recovery system of Embodiment 2, such as Figure 5 shown. The introduction of the first compression device further ensures that the exhaust gas is liquefied at a higher temperature, and it can also ensure that the heat preservation fluid can work at a higher temperature, such as above 0°C, which reduces the difficulty of controlling the temperature of the heat preservation fluid and makes it possible for water to be used as a heat preservation fluid. The retained fluid in this embodiment is water, and its working temperature range is 0-50°C, which can be adjusted with the temperature control device.

[0082] Please refer to Embodiment 2 for other device structures.

[0083] The operation method of the tail gas recovery system of the present embodiment is as follows, as image 3 , 5 Shown:

[0084] Step 1, according to Figure 5 Assembling the NWHE: make the tai...

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Abstract

The invention relates to a semiconductor manufacturing technology, provides a heat exchanger, and aims to treat tail gas. The heat exchanger comprises a tail gas channel and a heat absorption channel, wherein the tail gas channel consists of a plurality of first branch pipes with inlets and outlets; the heat absorption channel is filled with heat absorption fluid and comprises a plurality of second branch pipes; the number of first branch pipes is the same as that of second branch pipes; and the first branch pipes are embedded into the second branch pipes in an on-to-one correspondence manner, so that the heat exchange between the heat absorption fluid and the tail gas is realized. The invention also provides a tail gas recycling system assembled by the heat exchanger. According to the heat exchanger and the tail gas recycling system, the problem of pollution caused by metal organic chemical vapor depositions (MOCVD) to the environment is solved, the consumption of raw materials is saved, the cost is reduced, and the zero emission of the tail gas is realized; a semiconductor lighting product can replace the conventional lighting product as soon as possible; and the aim of environment friendliness is fulfilled.

Description

technical field [0001] The invention relates to vapor deposition technology, in particular to the tail gas recovery system structure of metal organic chemical vapor deposition equipment. Background technique [0002] Semiconductor lighting is a rapidly developing industry. In this industry, the production metal organic chemical vapor deposition (MOCVD) system is the key equipment necessary for the production of light-emitting diodes (LEDs) for semiconductor lighting. The rapid development of the industry has led to a rapid increase in the number of MOCVD. At present, my country has more than 500 MOCVD equipment. The MOCVD equipment used in the production of blue and green LEDs will produce ammonia (NH 3 ), nitrogen (N 2 ) and hydrogen (H 2 ), the tail gas treatment of MOCVD is an urgent problem to be solved. [0003] With the improvement of environmental protection requirements and awareness, the original water-washing exhaust gas treatment equipment has been basically...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D53/00F25J3/08F25J5/00C01C1/12C01B3/50
Inventor 朱建军周礼誉张永红
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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