Solid-liquid combined target-based extreme ultraviolet source generator and light source system

Abstract

The invention discloses an extreme ultraviolet source generator which comprises a focusing lens, a motor, a bearing, a temperature controller, a liquid target, a container and a solid target, wherein the solid target is arranged on the focal plane of the focusing lens; the liquid target is arranged in the container; the container is arranged under the solid target; part of the solid target is soaked into the liquid target; the temperature controller is used for heating the liquid target in the container so as to maintain the liquid target to be in a liquid state; the bearing is arranged in the center of the solid target; the motor is connected with the bearing; the motor is used for driving the solid target to rotate around the bearing; the solid target is stuck on the liquid target when rotating; and during work, the liquid target stuck above the solid target is bombed by laser beams which are focused by the focusing lens, plasma is produced by the interaction between the laser and the liquid target, and the extreme ultraviolet (EUV) can be emitted by the plasma. The generator and the light source system can be used for greatly eliminating the pollution of scrap to a reflecting mirror and other optical elements and improving the stability of the produced EUV, and are low in cost and easy in technology implementation.

Description

technical field [0001] The invention belongs to the field of laser applications, and more specifically relates to an extreme ultraviolet light source generating device and a light source system based on a solid-liquid composite target. Background technique [0002] With the development of photolithography technology, the required line width will become narrower and narrower, and the challenges faced will also become greater. At present, the wavelength of the light source used has reached the extreme ultraviolet band of 193nm, and has broken through the 22-node approach. At present, the international community is actively studying it as the most promising method in the next generation of lithography technology, in order to produce more integrated circuit. [0003] The main reason why extreme ultraviolet (EUV) lithography technology cannot be mass-produced is that EUV has low power and cannot be used for large-scale commercial use. At present, EUV light sources are mainly ob...

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Problems solved by technology

[0005] Aiming at the defects of the prior art, the purpose of the present invention is to provide an extreme ultraviolet light source generating device based on a solid-liquid composite target, aiming to solve the problem that the existing solid target has a lot of debris and the existing droplet target technology is complex and Problems that are difficult to implement

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