Cleaning machine with twin-jet nozzle
A cleaning device and double-nozzle technology are applied in spraying devices, cleaning methods and appliances, cleaning methods using liquids, etc., which can solve the problems that particles on the surface of the wafer cannot be washed away, and achieve simple structure, rapid response, and low price. Effect
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[0017] The present invention will be described in further detail below in conjunction with the accompanying drawings.
[0018] Such as figure 1 , figure 2 As shown, the present invention includes a nozzle electric cylinder 1, a spindle motor 2, a wafer holder 3, a housing 4, a nozzle arm 7, a spindle 9 and a workbench 10, wherein the spindle motor 2 is installed on the workbench 10, and the spindle 9 One end of the wafer is connected to the output end of the spindle motor 2, and the other end is equipped with a wafer table 3, and the wafer 8 is fixed on the wafer table 3, driven by the spindle motor 2 to rotate together with the wafer table 3. Outward rotation of the wafer platform 3 is provided with a housing 4 installed on the workbench 10, the housing 4 is cylindrical, used to collect the liquid that has cleaned the wafer 8, and the wafer platform 3 is located at the inside of the housing 4. middle. The nozzle electric cylinder 1 is installed on one side of the workbenc...
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