High-precision silver grid line screen production method for crystalline silicon solar cells

Abstract

The invention relates to the technical field of screens, in particular to a high-precision silver grid line screen production method for crystalline silicon solar cells. A screen fabric is formed by weaving a plurality of warps and wefts; each warp and each weft are parallel to or perpendicular to a screen frame respectively; adhesive is coated on the periphery of the screen fabric; and the screen fabric is fixed on the inner side surface of the screen frame after being tightened to form a screen. The high-precision silver grid line screen production method for the crystalline silicon solar cells solves the problems of low screen strike through rate and weak line resolution in the conventional silk screens, reduces break points generated when printing grid lines on crystalline silicon solar cell chips through thoroughly eliminating screen knots in strike through areas, and furthest improves the aperture opening ratio of the silk screens to realize the target of aspect-ratio fine line printing.

Description

technical field [0001] The invention relates to a method for making a screen, in particular to a method for making a high-definition positive silver grid wire screen for a crystalline silicon solar cell. Background technique [0002] The existing screen making process includes stretching the screen, degreasing, coating photosensitive emulsion, exposing and developing, and then forming the ink-permeable area of ​​the design pattern on the screen. Generally speaking, since the printing pattern is formed by the mesh arrangement of the mesh cloth, the screen and the screen frame are processed at a certain angle during the conventional stretching, and the light refraction and scattering of the steel wire during exposure at the same time will cause the printing pattern. Imprecise and incomplete. When steel wires are used to weave into mesh cloth, since the surface of the steel wires is glossy during the exposure process, the gloss will cause light refraction. Cross-section), the...

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Problems solved by technology

[0003] The technical problem to be solved by the invention is: the light refraction and scattering of steel wires during exposure will cause inaccurate and incomplete printing patterns, and there will be incomplete development in the development stage, because the intersection of warp and weft is in the development area The repetition and large number of occurrences will reduce the effective ink penetration area during printing and use. At the same time, the slurry will continue to accumulate in the network knots and small triangular areas, which will easily cause network blockage, line graphics missing to form false leads and broken grids. Some problems that cause the battery grade and electrical performance to decline obviously, provide a method for making a high-precision positive silver grid wire screen for crystalline silicon solar cells

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