Mask plate and method for composing a picture with same

Abstract

The invention provides a mask plate and a method for composing a picture with the same, and the mask plate and the method relate to the technical field of displaying and solve the problem of the prior art that no color film substrate with a large size can be manufactured. The mask plate comprises at least one mask unit group; each mask unit group form a row, and comprises a first mask unit which is arranged on one end, a second mask unit which is arranged on the other end, and at least one third mask unit which is arranged between the two ends; each mask unit is provided with a mask pattern; the mask pattern of each mask unit comprises a plurality of micro patterns and gaps on one side which is close to the adjacent mask unit and below the outline of the mask pattern; and the micro patterns and the gaps of the mask patterns of the two adjacent mask units on two sides which are close to each other are mutually matched. The mask plate and the method for composing the picture with the same are applicable to the field of the manufacturing of liquid crystal display devices.

Description

Technical field [0001] The present invention relates to the field of display technology, in particular to a mask and a method for patterning using the mask. Background technique [0002] In the prior art, a black matrix film layer, a color film layer, a protective film layer and a spacer film layer are formed on a color filter substrate. The black matrix film layer includes a black matrix pattern; the color film layer includes a pixel pattern; and the spacer film layer includes a spacer. The black matrix pattern, the pixel pattern and the spacer must pass through one exposure during the formation process, but due to the limitation of the exposure size of the exposure machine, only a certain size of pattern can be formed after one exposure. If you want to make a larger size color filter substrate, the pixel pattern and the spacers, because they are not integrated, can be completed by multiple exposures. However, the black matrix is ​​integrated, and there are splicing seams betw...

AI Technical Summary

Problems solved by technology

For example, the size of the existing glass substrate can be 2200*2500mm, but due to the limitation of the exposure area of ​​the exposure machine, a color filter substrate with a maximum size of 1120*1300mm can be formed after one exposure

[0003] According to the traditional method, in order to realize the manufacture of large-size color filter substrates, it is necessary to expand the mask plate and the exposure area, that is, to manufacture an exposure machine with a larger exposure area, the manufacturing cost is huge, and technically it cannot be designed to be infinitely large. exposure machine

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