Preparation method for anti-fingerprint film and anti-fingerprint film prepared by method

An anti-fingerprint and film technology, applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve the problems of easy sticking of fingerprints and oil stains on the surface

Active Publication Date: 2013-04-10
BYD CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the problem that fingerprints and oil stains are easily stuck on the surface of the touch screen in the prior art, the invention provides a method for preparing an anti-fingerprint film and an anti-fingerprint film prepared by this method. This film has Non-stick fingerprints, good anti-fouling effect, high light transmittance, at the same time, the film has strong adhesion on the surface of the substrate, good wear resistance, and is suitable for large-size touch screens

Method used

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preparation example Construction

[0009] The preparation method of the anti-fingerprint film disclosed by the present invention adopts magnetron sputtering to form an anti-fingerprint film on the surface of the substrate, the target material used in the magnetron sputtering is a fluorine-containing organic substance, and the reaction gas is filled in the magnetron sputtering process , the reaction gas is CF 4 and N 2 of mixed gas. Control CF when feeding reaction gas 4 and N 2 The flow ratio of the gas is 0.1-1:1, and the flow rate of the two gases is between 100-500 sccm. Magnetron sputtering makes the atoms in the target and the reaction gas deposit on the surface of the substrate to form a thin film containing three atoms of F, C and N, which not only significantly improves the anti-fingerprint effect, but also has high light transmittance and Wear resistance, and good adhesion. The substrate can be glass or metal.

[0010] The present invention uses fluorine-containing organic substances as target ma...

Embodiment 1

[0020] Wash the glass substrate with water in a 20KHz ultrasonic instrument for 20 minutes, put the cleaned glass substrate into the vacuum furnace of the magnetron sputtering apparatus, close the furnace door, and turn on the vacuum pump to evacuate to 10 -2 Pa, argon gas is introduced, the flow rate of argon gas is 200 sccm, the vacuum degree is adjusted to 1.5Pa, the bias voltage is 400V, the duty ratio is 35%, the sputtering power is 800W, and the glass substrate is subjected to ion bombardment treatment. for 5min. Then put the prefabricated target into the vacuum chamber, close the furnace door and evacuate to a vacuum degree of 10 -2 Pa, through the reaction gas CF 4 and N 2 , CF 4 The flow rate is 100 sccm, N 2 The flow rate is 330 sccm, adjust the CF 4 and N 2 The ratio is 0.3:1, the vacuum degree is 0.8Pa, the RF power is turned on, the power of the target power is 800W, the bias voltage is 50V, the duty cycle is 20%, and the time is 15min. After cooling for 3 ...

Embodiment 2

[0022] Wash the glass substrate with water in a 20KHz ultrasonic instrument for 20 minutes, put the cleaned glass substrate into a vacuum furnace, close the furnace door, turn on the vacuum pump to evacuate, and evacuate to 10 -2 Pa, argon gas is introduced, the flow rate of argon gas is 250 sccm, the vacuum degree is adjusted to 1.5Pa, the bias voltage is 500V, the duty ratio is 40%, the sputtering power is 600W, and the glass substrate is subjected to ion bombardment treatment, time for 3min. Then put the prefabricated target into the vacuum chamber, close the furnace door and evacuate to a vacuum degree of 10 -2 Pa, through the reaction gas CF 4 and N 2 , CF 4 The flow rate is 300 sccm, N 2 The flow rate is 300 sccm, adjust the CF 4 and N 2 The ratio is 1:1, the vacuum degree is 0.8Pa, the RF power is turned on, the power of the target power is 1000W, the bias voltage is 100V, the duty cycle is 30%, and the time is 8min. After cooling for 3 minutes, take it out of th...

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Abstract

The invention provides a preparation method for an anti-fingerprint film and the anti-fingerprint film prepared by the method, the method employs magnetron sputtering to form the anti-fingerprint film on the surface of a base material, the target material employed by the magnetron sputtering is a fluorine containing organic matter, a reaction gas is filled in a process of the magnetron sputtering, and the reaction gas is a mixed gas of CF4 and N2. The anti-fingerprint film prepared by the method contains three elements of F, C and N, and the ratio of fluorine to carbon is greater than or equal to 2:1. The high ratio of fluorine to carbon makes the film to have excellent antifouling effect, and the film has the characteristics of high light transmittance, strong adhesive force and good wear resistance. The anti-fingerprint film is suitable for a touch screen with a large size.

Description

technical field [0001] The invention belongs to the field of film material preparation, and in particular relates to a film with anti-fingerprint and oil stain functions and a preparation method thereof. Background technique [0002] As the latest input technology, touch screen is currently the simplest, most convenient and natural way of human-computer interaction. It endows multimedia with a new look and is a very attractive new multimedia interactive device. [0003] With the development of the electronic industry, the application of touch screen is more and more extensive, from the initial small screen mobile phone, MP3, to the computer, ATM, medical treatment, industrial control equipment and monitor and TV set of large size screen now. Especially in the past two years, the introduction of iPhone mobile phones and ipad computers has driven the development of touch screen technology, and this technology is also being gradually applied to other portable electronic produc...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/06
Inventor 赵严帅孙永亮罗迪恬周维
Owner BYD CO LTD
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