Device and method for preparing ultra-high purity difluoromono-chloroethane
A difluoro-chloroethane, ultra-high-purity technology, applied in the preparation of halogenated hydrocarbons, chemical instruments and methods, disproportionation separation/purification of halogenated hydrocarbons, etc., can solve the problem of incomplete absorption of HCl and chlorine and incomplete reaction of raw materials , The product purity is not high, to achieve the effect of inhibiting the formation of by-products, saving raw materials, and ensuring cycle stability
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Embodiment 1
[0049] The present invention prepares the method for ultrahigh-purity difluoro-chloroethane comprising the following steps:
[0050] (1) Reaction: After the raw materials difluoroethane and liquid chlorine are gasified, they are mixed at a molar ratio of 1.15:1, and then enter the photochlorination reactor 1 for photochlorination reaction. The reaction temperature is 40°C, the reaction pressure is 0.05MPa, and the reaction residence time is 60S, the feeding amount of difluoroethane for a single photochlorination reactor is 100-150Kg / h;
[0051] (2) Water washing: The gas reacted in the photochlorination reactor absorbs hydrogen chloride through the two-stage water absorption HCl tower 2, and the working pressure in the tower is 1.5MPa, the temperature in the tower is 40°C, and the absorbed HCl is dissolved in water Converted into hydrochloric acid with a concentration of 25-30%;
[0052] (3) Alkali washing: the gas after removing HCl is removed through the two-stage alkali li...
Embodiment 2
[0058] The present invention prepares the method for ultrahigh-purity difluoro-chloroethane comprising the following steps:
[0059] (1) Reaction: After the raw materials difluoroethane and liquid chlorine are vaporized, they are mixed at a molar ratio of 1.15:1, and enter the photochlorination reactor 1 for photochlorination reaction. The reaction temperature is 80°C, the reaction pressure is 0.1MPa, and the reaction residence time is 90S, the feed rate of difluoroethane for a single photochlorination reactor is 100-150Kg / h;
[0060] (2) Water washing: The gas reacted in the photochlorination reactor absorbs hydrogen chloride through the two-stage water absorption HCl tower 2, and the working pressure in the tower is 2.0MPa, the temperature in the tower is 80°C, and the absorbed HCl is dissolved in water Converted into hydrochloric acid with a concentration of 25-30%;
[0061] (3) Alkali washing: the gas after removing HCl is removed through the two-stage alkali liquid absor...
Embodiment 3
[0067] The present invention prepares the method for ultrahigh-purity difluoro-chloroethane comprising the following steps:
[0068] (1) Reaction: After the raw materials difluoroethane and liquid chlorine are vaporized, they are mixed at a molar ratio of 1.15:1, and then enter the photochlorination reactor 1 for photochlorination reaction. The reaction temperature is 60°C, the reaction pressure is 0.07MPa, and the reaction residence time is 70S, the feed rate of difluoroethane for a single photochlorination reactor is 100-150Kg / h;
[0069] (2) Water washing: The gas reacted in the photochlorination reactor absorbs hydrogen chloride through the two-stage water absorption HCl tower 2, and the working pressure in the tower is 1.7MPa, the temperature in the tower is 60°C, and the absorbed HCl is dissolved in water Converted into hydrochloric acid with a concentration of 25-30%;
[0070] (3) Alkali washing: the gas after removing HCl is removed through the two-stage alkali liquid...
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