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Two-degree-of-freedom nanometer positioning platform

A nano-positioning and degree-of-freedom technology, applied in optics, opto-mechanical equipment, instruments, etc., can solve problems such as uneven distribution of imprinting force, limitation of processing accuracy and quality, easy stretching and deformation of silica gel, etc., to achieve micro-feeding and Precise positioning, non-linearity elimination, assembly-free effects

Inactive Publication Date: 2013-03-27
TIANJIN UNIV
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among these existing technologies, although the self-adaptive adjustment precision positioning system is simple in structure, compact in structure and low in cost, its positioning accuracy, especially the adjustment accuracy of parallelism is low, which limits the improvement of processing accuracy and quality
Although the parallelism between the imprint template and the substrate can be improved to a certain extent through active leveling and manual adjustment mechanisms, it cannot compensate for the parallelism error between the template and the substrate due to uneven imprint force during the imprinting process
The airbag cylinder type imprinting system overcomes the disadvantages that the silicone is easily stretched and deformed during the imprinting process, the imprinting force is unevenly distributed, and the template is easy to break. However, the design and use of the vacuum chamber is expensive and the imprinting time is too long.

Method used

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Embodiment Construction

[0020]In order to further understand the content of the invention, features and effects of the present invention, the following embodiments are exemplified and described in detail with the accompanying drawings as follows:

[0021] see Figure 1 to Figure 3 , a two-degree-of-freedom nano-positioning platform, comprising a moving platform 2 and a base 1, the moving platform 2 and the base 1 are connected by flexible branches in the X-axis direction and flexible branches in the Y-axis direction.

[0022] The flexible branch chain in the X-axis direction includes a piezoelectric ceramic driver 3 arranged in a direction parallel to the X-axis, a displacement amplifying lever 6 arranged in a direction parallel to the Y-axis, a first moving block 8 and a second moving block 12 .

[0023] The piezoelectric ceramic driver 3 arranged in the direction parallel to the X axis is placed horizontally, and a ball joint 4 is installed at the top, and the ball joint 4 is in contact with the bo...

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Abstract

The invention discloses a two-degree-of-freedom nanometer positioning platform. The nanometer positioning platform comprises a movable platform and a base which are connected with each other through a flexible branched chain in an x-axis direction and a flexible branched chain in an y-axis direction. As adopting a flexible parallel connection structure, the nanometer positioning platform has the advantages of high rigidity, high precision, low inertia, compact structure, no error accumulation and the like; and as adopting a flexible plate spring as a transmission component, the nanometer positioning platform has the advantages of no mechanical friction and no gap. Furthermore, based on the elastic deformation of materials, the tiny deformation generated by the flexible plate spring and a tiny working space at the tail end of an actuator, the nanometer positioning platform can effectively eliminate the defects of non-linearity and the like of a parallel connection mechanism; and two piezoelectric ceramic drivers are used for respectively driving the two flexible branched chains, so that a relative position of a template and a substrate in an imprint lithography process can be initiatively adjusted. The two-degree-of-freedom nanometer positioning platform provided by the invention can be taken as an auxiliary positioning platform of a nanometer imprint lithography positioning system, and can implement micro-scale feeding and precise positioning.

Description

technical field [0001] The invention belongs to a micro / nano precision workbench, in particular to a two-degree-of-freedom parallel flexible precision positioning workbench which can provide precise plane positioning in the fields of micro / nano surface measurement and micro / nano operation. Background technique [0002] Nanodevices include nanoelectronic devices and nanophotoelectric devices, which can be widely used in electronics, optics, micromechanical devices, new computers, etc. , intelligent, high integration and other mainstream development directions. Due to the potential huge market and national defense value of nanodevices, the methods, approaches and processes of its design and manufacture have become the research and investment hotspots of many scientists, governments and large enterprises. At present, the design and manufacture of nano-devices are in a period of rapid development. There are various methods, and patterning technology is one of them. [0003] Na...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
Inventor 田延岭秦岩丁张大卫田佳
Owner TIANJIN UNIV
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