3T1R four-degrees-of-freedom precise location workbench

Abstract

The invention discloses a 3T1R four-degrees-of-freedom precise location workbench, comprising a moving platform, a flexible tail end support frame, four flexible branch chains, a base and four piezoelectric ceramic drivers. The flexible tail end support frame is I-shaped, and is located between the tops of the four flexible branch chains and the moving platform; the moving platform is fixed on a rigid support; the four flexible branch chains are connected in parallel between the base and the flexible tail end support frame, and have the same structure; each flexible branch chain comprises a flexible driving arm and a flexible driven arm, which are connected by a second elastic hinge; the rigid support table is fixed on the base, the four piezoelectric ceramic drivers are horizontally mounted on the rigid support table, and respectively drive the driving arms of the four flexible branch chains. The 3T1R four-degrees-of-freedom precise location workbench uses the flexible parallel connection structure, and has the advantages of high rigidity, high precision, low inertia, compact structure, no error accumulation, and so on.

Description

technical field [0001] The invention belongs to a micro-operating system, in particular to a 3T1R four-degree-of-freedom precision positioning workbench applicable to an imprint photolithography system. Background technique [0002] Nano-devices can be widely used in electronics, optics, micro-mechanical devices, new computers, etc. It is the most dynamic research field in the field of new materials and new devices, and it is also the key to the miniaturization, intelligence, and high integration of components. mainstream development direction. Nano-imprint lithography is a brand-new method of nano-pattern replication. It has obvious advantages and strong competitiveness. It fundamentally shows the broad prospects for the production of nano-devices. Therefore, at the end of 2003, it was planned as the next The key technology of the first-generation 32nm node lithography process. [0003] Positioning the stage has always been a critical part of traditional lithography syste...

AI Technical Summary

Problems solved by technology

The driving speed of the precision positioning mechanism combined with the ball guide rail and the threaded screw driving mechanism is difficult to meet the speed requirements of the workbench of the photolithography system, and the application range is limited

However, the precision positioning system that uses a stepping motor driven by a friction mechanism and a ball guide rail to drive the worktable is difficult to overcome the disadvantages of intermittent motion, low-speed crawling and high-speed vibration, long time for mechanical stability establishment, and inability to achieve high motion positioning accuracy.

LeeDeug Woo et al., Research on automatic alignment system for nanoimprint lithography process, Proceedings of the 1 st International Conference on Positioning Technology Japan: Hamamatsu, 97~101 in 2004 (Lee Deug Woo, Lee Chae Moon, Chee Dong Hwan. A study on auto alignment system of Nano Imprint Lithography (NIL) process. Proceedings of the 1 st The hemispherical air bearing imprinting machine introduced in International Conference on Positioning Technology Japan: Hamamatsu, 2004.97~101) uses the airflow valve to control the pressure, and realizes the parallelism adjustment of the wafer table through the hemispherical air bearing, which is low in cost and simple in structure. But the adjustment accuracy needs to be improved

In addition, the new type of precision positioning system using piezoelectric ceramics and linear motor composite drive can effectively improve the positioning accuracy of nanoimprint equipment and reduce the system stabilization time, but the parallelism of end effectors in existing imprint equipment The degree adjustment adopts a passive method, that is, through the elastic deformation of the flexible material in the imprinting process, the self-adaptive adjustment of the position and posture of the wafer stage is realized, which limits the improvement of the imprinting accuracy and quality. For example, B.J.Choi et al. Design of orientation stage for imprint lithography, Precision Engineering, 2001, Volume 25, Issue 3, 192-199 (B.J.Choi, S.V.Sreenivasan, S.Jonhson, M.Colburn, C.G.Wilson, Design of orientation stage for step and flash imprint lithography, Precision Engineering, 2001,25(3):192-199.), Jae-Jong Lee, etc. Design and analysis of nanoimprint lithography equipment for producing 100nm line width features, Current Applied Physics, No. 6, 2006 , 1007-1011 (Jae-Jong Lee, Kee-Bong Choi, Gee-Hong Kim, Design and analysis of the single-step nanoimprinting lithography equipment for sub-100nm linewidth, Current Applied Physics 2006, 6:1007–1011.) This type of equipment and related technologies have been reported

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