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Three-degree of freedom flexible precision positioning workbench

A technology of precise positioning and degrees of freedom, applied in the field of micro-operating systems, can solve the problems of uneven distribution of imprinting force, limitation of machining accuracy and quality, easy stretching and deformation of silicone, etc. Linear, assembly-free effect

Inactive Publication Date: 2011-06-22
TIANJIN UNIV
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  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among these existing technologies, although the self-adaptive adjustment precision positioning system is simple in structure, compact in structure and low in cost, its positioning accuracy, especially the adjustment accuracy of parallelism is low, which limits the improvement of processing accuracy and quality
Although the parallelism between the imprint template and the substrate can be improved to a certain extent through active leveling and manual adjustment mechanisms, it cannot compensate for the parallelism error between the template and the substrate due to uneven imprint force during the imprinting process
The airbag cylinder type imprinting system overcomes the disadvantages that the silicone is easily stretched and deformed during the imprinting process, the imprinting force is unevenly distributed, and the template is easy to break. However, the design and use of the vacuum chamber is expensive and the imprinting time is too long.

Method used

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  • Three-degree of freedom flexible precision positioning workbench
  • Three-degree of freedom flexible precision positioning workbench
  • Three-degree of freedom flexible precision positioning workbench

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Embodiment Construction

[0018] The specific embodiments, structures, features and effects provided according to the present invention will be described in detail below with reference to the accompanying drawings and examples.

[0019]see Figures 1 to 4 , a three-degree-of-freedom precision positioning stage for nanoimprint lithography systems. It includes a rigid support 7 and a base 2 connected to the top of the rigid support 7. A moving platform 4 with a rectangular cross-section is connected in the middle of the base 2 through six flexible branches. Two of the six flexible branched chains are respectively arranged along the centerline direction of the upper and lower opposite sides of the moving platform 4, and the other four flexible branched chains are located at the left and right opposite sides of the moving platform respectively and in two groups. The left and right two sets of flexible branch chains are arranged symmetrically with respect to the vertical axis of symmetry of the moving plat...

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Abstract

The invention discloses a three-degree of freedom flexible precision positioning workbench. In a structure of the workbench, six piezoelectric ceramic drivers are adopted, the tail of each driver is connected with a substrate through bolts, and the top end is in threaded connection with a ball joint to realize hertz contact; a flexible structure of the positioning workbench mainly comprises the substrate, six flexible branched chains with identical structures and a movable platform supported by the flexible branched chains; and three position sensors are used for measuring the actual output of the movable platform and are respectively fixed between a rigid support and the movable platform. The precision positioning workbench has the characteristics of high resolution ratio and high speed of dynamic response, and can be used as an assisted positioning platform of a nano-imprint lithography positioning system to realize microscale feeding and precision positioning.

Description

technical field [0001] The invention belongs to a micro-operating system, in particular to a two-translation-one-rotation flexible precision positioning worktable which can be applied to an imprint lithography system. Background technique [0002] Nanodevices include nanoelectronic devices and nanophotoelectric devices, which can be widely used in electronics, optics, micromechanical devices, new computers, etc. , intelligent, high integration and other mainstream development directions. Due to the potential huge market and national defense value of nanodevices, the methods, approaches and processes of its design and manufacture have become the research and investment hotspots of many scientists, governments and large enterprises. At present, the design and manufacture of nano-devices are in a period of rapid development. There are various methods, and patterning technology is one of them. [0003] Nanoimprint lithography is a patterning technique developed in the process ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 田延岭贾晓辉张大卫
Owner TIANJIN UNIV
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