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Preparation method of multi-metal doping hydrogen-free diamond carbon film

A multi-element metal and diamond thin film technology, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of reducing the internal stress of the film, poor thermal stability, poor bonding force of the film base, etc., to achieve optional Strong performance, strong process operability and good repeatability

Inactive Publication Date: 2013-03-13
CHINA UNIV OF GEOSCIENCES (BEIJING)
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AI Technical Summary

Problems solved by technology

It uses ion beam assisted deposition technology, uses inlaid metal targets and graphite targets, and under the auxiliary bombardment of auxiliary sources, it prepares multi-element metal-doped hydrogen-free diamond-like carbon films by ion beam sputtering deposition, which not only maintains the high hardness of diamond-like carbon films And the characteristics of low friction coefficient, and greatly improve the wear resistance and thermal stability, reduce the internal stress of the film, solve the problems of high internal stress of the diamond-like film, poor bonding force of the film base and poor thermal stability, and prepare at the same time The thin film has excellent comprehensive properties that single metal doping does not have, and can be widely used in the surface treatment of silicon and various metal materials

Method used

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  • Preparation method of multi-metal doping hydrogen-free diamond carbon film

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Embodiment 1

[0025] 1. Use tungsten and molybdenum mosaic target (tungsten is used as the basic target material, mosaic block material is molybdenum);

[0026] 2. Ultrasonic clean the stainless steel sheet, after drying, fix it on the workpiece rack in the vacuum chamber of the ion beam assisted deposition coating equipment and vacuumize it, and pre-vacuumize it to 2.0×10 -4 Pa;

[0027] 3. Connect the sputtering ion source and the auxiliary source gas source, pass the argon gas into the vacuum chamber, and keep the air pressure lower than 1.4×10 -2 Pa, the sputtering source uses an ion beam with a voltage of 2.7KV and a current of 100mA to bombard the target; the auxiliary source uses a voltage of 0.2KV and a beam of 100mA to bombard and clean the sample and activate the surface; the bombardment time is 10min.

[0028] 4. The sputtering source uses an ion beam with a voltage of 2.7KV and an ion beam current of 75mA to bombard the graphite target; an ion beam with a voltage of 2.2KV and a...

Embodiment 2

[0032] 1. Titanium chromium mosaic target is used (titanium is used as the basic target material, and the mosaic block material is chromium);

[0033] 2. Ultrasonic clean the high-speed steel mold piece, after drying, fix it on the workpiece rack in the vacuum chamber of the ion beam assisted deposition coating equipment and vacuumize it, and pre-vacuumize it to 2.0×10 -4 Pa;

[0034] 3. Connect the sputtering ion source and the auxiliary source gas source, pass the argon gas into the vacuum chamber, and keep the air pressure lower than 1.5×10 -2 Pa, the sputtering source uses an ion beam with a voltage of 2.7KV and a current of 100mA to bombard the target; the auxiliary source uses a voltage of 0.2KV and a beam of 100mA to bombard the sample for cleaning and surface activation; the bombardment time is 10min.

[0035] 3. The sputtering source uses an ion beam with a voltage of 2.5KV and an ion beam current of 80mA to bombard the graphite target; an ion beam with a voltage of ...

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Abstract

The invention discloses a preparation technology of a multi-metal doping hydrogen-free diamond carbon film. The preparation technology is characterized in that by using an ion beam auxiliary deposition technology, a multi-metal mosaic target (formed by mosaicking a mosaic block 2 in a sputtering region 3 on a base target material 1) and a graphite target are used for double-target sputtering, and the multi-metal doping hydrogen-free diamond film is deposited and prepared on the surface of a workpiece. The preparation technology comprises the following specific steps: preparing the mosaic target, cleaning and activating ions on the surface of the workpiece, and depositing and preparing the multi-metal doping hydrogen-free diamond film. Compared with the prior art, the film prepared by the method has the advantages of higher hardness, film-based bonding force, elasticity modulus, abrasion resistance and hot stability property; and doping components can be adjusted so that the film can meet the requirement of transmission parts of precise instruments for accuracy and increases the reliability of the transmission parts. The film is suitable for surface treatment of silicon and various metal workpieces.

Description

technical field [0001] The invention relates to the surface treatment of materials, in particular to a deposition and preparation method of multi-element metal-doped hydrogen-free diamond-like film. Background technique [0002] As a new type of lubricating film material, diamond-like film has excellent properties such as high hardness, small friction coefficient, and long wear life. Related fields have shown great application prospects as lubricating film materials. However, due to its high internal stress, poor thermal stability, and strong environmental dependence, it has been greatly limited in practical applications. The diamond-like carbon films prepared by modern technology are mainly divided into two types: hydrogen-containing and hydrogen-free films. However, compared with hydrogen-free diamond-like films, hydrogen-containing diamond-like films have relatively low hardness and relatively low internal stress. The wear resistance under atmospheric conditions is also...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/34
Inventor 岳文王松付志强王成彪于翔彭志坚
Owner CHINA UNIV OF GEOSCIENCES (BEIJING)
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