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Process for producing trichlorosilane through inverse disporportionation of dichlorosilane

A technology of dichlorodihydrosilicon and trichlorosilane, which is applied to halogenated silicon compounds, halogenated silanes, etc., can solve the problems of loss of silicon element, consumption of large manpower and material resources, uneconomical and other problems, and achieves mild reaction conditions and reduced The effect of small processing costs and system investment

Inactive Publication Date: 2013-02-13
SICHUAN RENESOLA SILICON MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, due to the complex reaction in the reduction furnace, dichlorodihydrosilane, another by-product of light components, will be produced. Dichlorodihydrosilane will enter the tail gas dry recovery system and rectification workshop in sequence with the tail gas, and finally enter the rectification tower. Top Discharge dichlorodihydrosilane to the waste gas treatment process for washing treatment by discharging low-boiling tail gas
In the large-scale polysilicon production system, the emission of dichlorodihydrosilane is large, and the tail gas of dichlorodihydrosilane is washed in the washing tower with factory domestic water, so that the dichlorodihydrogensilane gas is hydrolyzed with water to form silicon dioxide and dilute Hydrochloric acid, the silicon dioxide powder produced is processed by salvage and collection in the pool, and the dilute hydrochloric acid is neutralized by lye, and the treatment of the silicon dioxide powder collected by salvage requires a lot of manpower and material resources, which is not conducive to environmental protection; Hydrochloric acid needs to consume a large amount of lye, which is very uneconomical; at the same time, the silicon element in the light component dichlorodihydrosilane gas is lost, and it is necessary to supplement silicon powder to synthesize trichlorosilane, the raw material for polysilicon.

Method used

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  • Process for producing trichlorosilane through inverse disporportionation of dichlorosilane

Examples

Experimental program
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Effect test

Embodiment 1

[0028] The gaseous dichlorodihydrogen silicon in the polysilicon production system is condensed through the -20°C frozen brine of the dichloro dihydrogen silicon condenser, and the silicon tetrachloride liquid is cooled by the process water of the silicon tetrachloride cooler. 1:3 into the storage tank for mixing.

[0029] The feed temperature of the mixed raw materials is -10°C, and they are sent into the reactor through a shielded pump for reaction. The reactor is a fixed bed reactor, and it is filled with an anion exchange resin catalyst from Chengdu Nankai Resin Co., Ltd. to control the reaction. The total reaction temperature of the device is 30°C, and the reaction pressure is 0.2MPa. The mixed solution of dichlorodihydrosilane and silicon tetrachloride passes through the catalyst from top to bottom, and the residence time of the liquid raw material in the catalyst packing is 5s, and a part of the reaction raw material occurs Catalyzed reaction deproportionation produces ...

Embodiment 2

[0032] The gaseous dichlorodihydrogen silicon in the polysilicon production system is condensed through the -20°C frozen brine of the dichloro dihydrogen silicon condenser, and the silicon tetrachloride liquid is cooled by the process water of the silicon tetrachloride cooler. 1:3.5 into the storage tank for mixing.

[0033]The feed temperature of the mixed raw materials is 0°C, and they are sent into the reactor through a shielded pump for reaction. The reactor is a fixed-bed reactor, and the anion exchange resin catalyst of Chengdu Nankai Resin Co., Ltd. is filled inside, and the reactor is controlled. The total reaction temperature is 40°C, the reaction pressure is 0.25MPa, the mixture of dichlorodihydrosilane and silicon tetrachloride passes through the catalyst from top to bottom, the residence time of the liquid raw material in the catalyst packing is 6S, and a part of the reaction raw material is catalyzed The reaction deproportionates to generate trichlorosilane. Under...

Embodiment 3

[0035] The gaseous dichlorodihydrogen silicon in the polysilicon production system is condensed through the -20°C frozen brine of the dichloro dihydrogen silicon condenser, and the silicon tetrachloride liquid is cooled by the process water of the silicon tetrachloride cooler. 1:4 into the storage tank for mixing.

[0036] The feed temperature of the mixed raw materials is 10°C, and they are sent into the reactor by shielded pumps for reaction. The reactor is a fixed-bed reactor, and the inside of it is filled with an anion exchange resin catalyst from Dow Chemical Co., Ltd. of the United States. The total reaction temperature of the reactor is 50°C, and the reaction pressure is 0.3MPa. The mixture of dichlorodihydrosilane and silicon tetrachloride passes through the catalyst from top to bottom, and the residence time of the liquid raw material in the catalyst packing is 8S. A part of the reaction raw material Catalytic reaction and disproportionation to generate trichlorosila...

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Abstract

The invention discloses a process for producing trichlorosilane through inverse disporportionation of dichlorosilane, particularly to a process for producing the trichlorosilane through inverse the disporportionation of the dichlorosilane in a polycrystalline silicon production system, and belongs to the technical field of silicon chemical industry; according to the invention, in an inverse disporportionation process of the dichlorosilane, a mixed material of liquid dichlorosilane and liquid silicon tetrachloride is adopted; a fixed-bed reactor loaded with a catalyst is adopted for reaction; and mild reaction condition, low equipment investment and less energy consumption are obtained; inverse disporportionation can be carried out on side product dichlorosilane of the polycrystalline silicon production system so as to generate the trichlorosilane, so that the production cost and treatment cost of the dichlorosilane are reduced; as a gas-liquid separating unit and a rectifying raw material product separating system are also designed in the process, the traditional processing equipment of the production system can be sufficiently utilized, and the raw material utilization rate of the polycrystalline silicon production system is increased.

Description

technical field [0001] The invention relates to a process for producing trichlorosilane by deproportionation of dichlorodihydrosilicon, in particular to a process for producing trichlorosilane by deproportionation of dichlorodihydrogensilicon in a polysilicon production system, and belongs to the technical field of silicon chemical industry. Background technique [0002] In the production process of polysilicon by the improved Siemens method, trichlorosilane and hydrogen undergo reduction reaction in the reduction furnace to generate polysilicon. Since the conversion rate of trichlorosilane in the furnace is low, a large amount of unreacted raw materials trichlorosilane and hydrogen are used as The reaction tail gas is discharged. In order to improve the utilization rate of raw materials and reduce production costs, these tail gases (mainly composed of trichlorosilane gas, silicon tetrachloride gas and hydrogen) are sent to the tail gas dry recovery system to condense the chl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
Inventor 李仕扬沈伟
Owner SICHUAN RENESOLA SILICON MATERIAL
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