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Titanium dioxide photo-catalyzed film and preparation method thereof

A photocatalytic thin film, titanium dioxide technology, applied in ion implantation plating, electrolytic coating, surface reaction electrolytic coating, etc., can solve the problems such as not found, and achieve large specific surface area, excellent photocatalytic performance, excellent light transmittance and light The effect of catalytic performance

Active Publication Date: 2013-01-09
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Through further search and analysis of the literature, no titanium dioxide with mesoporous structure prepared by anodic titanium oxide film has been found so far, and has a high light transmittance of more than 90% and a photocatalytic reaction rate constant |k| of 1.47~1.43h -1 The photocatalytic performance of the reported

Method used

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  • Titanium dioxide photo-catalyzed film and preparation method thereof
  • Titanium dioxide photo-catalyzed film and preparation method thereof
  • Titanium dioxide photo-catalyzed film and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0047] (1) Deposition of titanium film on FTO glass by magnetron sputtering

[0048] Sputtering deposition of titanium film: In the deposition chamber, the background pressure of the deposition chamber is 5×10 -5 Pa. A DC power supply is used, the Ti target is installed on the cathode, the glass substrate is installed on the anode, and the distance between the Ti target and the glass substrate is 62mm. Introduce Ar gas, adjust the chamber pressure to 0.1Pa, and the power density of the Ti target to 3.7w / cm 2 . At room temperature (20°C), the titanium film was deposited by sputtering on the substrate for 22 minutes to obtain a titanium film with a columnar structure with a thickness of 510nm and a column width of 100-200nm. The XRD pattern of the titanium film shows that the diffraction intensities of the (002) plane and (101) plane are I(002) and I(101) respectively, these values ​​satisfy I(002)>I(101), and the film layer is in the (002) Preferential growth on the crystal...

Embodiment 2

[0055] (1) Deposit titanium film on ordinary glass by magnetron sputtering method

[0056] Sputtering deposition of titanium film: In the deposition chamber, the background pressure of the deposition chamber is 5×10 -4 Pa. AC power is used, the Ti target is installed on the cathode, the glass substrate is installed on the anode, and the distance between the Ti target and the glass substrate is 75mm. Introduce Ar gas, adjust the chamber pressure to 1Pa, and the power density of the Ti target to 6.2w / cm 2 . At 30°C, the titanium film was deposited by sputtering on the substrate, and the deposition time was 16 minutes to obtain a columnar titanium film with a thickness of 420nm and a column width of 400-500nm. The XRD pattern of the titanium film shows that the diffraction intensities of the (002) plane and (101) plane are I(002) and I(101) respectively, these values ​​satisfy I(002)>I(101), and the film layer is in the (002) Preferential growth on the crystal face. The SEM ...

Embodiment 3

[0063] (1) Deposit titanium film on ordinary glass by magnetron sputtering method

[0064] Sputtering deposition of titanium film: In the deposition chamber, the background pressure of the deposition chamber is 1×10 -4 Pa. A DC power supply is used, the Ti target is installed on the cathode, the glass substrate is installed on the anode, and the distance between the Ti target and the glass substrate is 62mm. Introduce Ar gas, adjust the chamber pressure to 0.5Pa, and the power density of the Ti target to 4.3w / cm 2 . At 30° C., a titanium film was sputter-deposited on the substrate for 18 minutes to obtain a columnar titanium film with a thickness of 468 nm and a column width of 300 nm. The XRD pattern of the titanium film shows that the diffraction intensities of the (002) plane and (101) plane are I(002) and I(101) respectively, these values ​​satisfy I(002)>I(101), and the film layer is in the (002) Preferential growth on the crystal face. The SEM image of the titanium ...

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Abstract

The invention discloses a titanium dioxide photo-catalyzed film and a preparation method thereof. The titanium dioxide photo-catalyzed film has a spongy porous structure; the length of holes along the growth direction is 200nm-800nm; and the maximal width of the holes along the direction vertical to the growth direction is 10nm-300nm. The preparation method for the titanium dioxide photo-catalyzed film comprises the following steps: depositing a columnar structural titanium film on a substrate by adopting a magnetron sputtering method, wherein the depositing pressure is 0.1-1Pa; preparing the titanium dioxide having a porous structure by anodizing the titanium film; sputtering the deposited titanium film as an anode and taking graphite as a cathode; taking a mixed solution of ammonium fluoride, water and organic saturate alcohol as an electrolyte; keeping a constant voltage at 25-50V; and thermally treating, thereby obtaining the titanium dioxide photo-catalyzed film. The titanium dioxide photo-catalyzed film provided by the invention has the characteristics of high light transmission and high photo-catalytic reaction rate constant and meets the requirements of photo-catalyzed materials, such as self-cleaning glass, air and waste water purifier, and the like.

Description

technical field [0001] The invention relates to the technical field of photocatalytic film material preparation, in particular to a titanium dioxide photocatalytic film and a preparation method thereof. Background technique [0002] Titanium dioxide is one of the wide-bandgap semiconductor materials with the most application potential at present, especially the ability of photoexcitation to generate electron-hole pairs has been widely used in the field of photocatalysis. [0003] Anodic oxidation on bulk titanium metal such as titanium foil or titanium alloy is currently the most widely used method for preparing titanium dioxide. The research group of Professor Craig A.Grimes in the United States published a series of articles on the preparation of titanium dioxide nanotubes by anodic oxidation on titanium foil. The photocatalytic activity of titanium dioxide nanotubes prepared by anodic oxidation is about 3 times stronger than that of flat titanium dioxide films, and anodi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D11/26C23C14/35C23C14/14
Inventor 黄峰戴丹李朋李艳玲
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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