Wide-band gap multi-heterojunction tunnel junction structure
A multi-heterojunction and tunneling junction technology, which is applied in the field of wide-bandgap multi-heterojunction tunneling junction structures, can solve the problems of low peak current density of wide-bandgap tunneling junctions, etc. The effect of resistance
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[0014] The first embodiment of the present invention is as figure 1 As shown, there are first bandgap subcell 11, first functional layer 12, second functional layer 13, third functional layer 14, fourth functional layer 15, second bandgap subcell 16 and hat layer 17. The substrate 10 is Ge or GaAs. The first bandgap subcell 11 is a PN-type homojunction or heterojunction composed of one or more materials such as GaAs, GaInAs, GaInNAs, GaInNAsSb, GaInAsP, AlGaAs, AlGaAsP, AlGaInAs, GaInP, AlGaInP. The first functional layer 12 is made of AlGaInP, the Al composition is 0.85, doped with Si, the thickness is 20-100nm, and the doping concentration is 1×10 19 cm -3 ; The second functional layer 13 is made of AlGaInP, the Al composition is 0.15, the doping is Si, the thickness is 10-20nm, and the doping concentration is 5×10 19 cm -3 ; The third functional layer 14 is composed of AlGaAs, the Al composition is 0.15, the doping is C, the thickness is 10-20nm, and the doping concent...
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