Method for manufacturing patterned substrate

Abstract

The invention discloses a method for manufacturing a patterned substrate. The method comprises the followings steps of: providing a substrate; depositing an indium tin oxide thin film on the substrate; carrying out wet-method etching on the indium tin oxide thin film by using an indium tin oxide corrosion solution, so as to form a discontinuous indium tin oxide thin film on the surface of the substrate; taking the discontinuous indium tin oxide thin film as a mask and etching the substrate by a dry method to form a concave-convex substrate surface; utilizing the indium tin oxide corrosion solution to remove the residual discontinuous indium tin oxide thin film from the substrate to form the patterned substrate. The method for manufacturing the patterned substrate, disclosed by the invention, has the advantages of high production efficiency and low cost and is suitable for manufacturing of the small patterned substrate.

Description

technical field [0001] The invention relates to the field of substrate fabrication, and more particularly to a patterned substrate fabrication method. Background technique [0002] Since the manufacture of LED devices generally adopts a lateral structure, the body shape is that the left and right sides of a cuboid are parallel to each other. Although most of the light emitted by the active region exits from the top of the P-type region, due to the large difference in refractive index between the semiconductor material and air, LEDs When light is emitted from a chip with a large refractive index to air with a small refractive index, total reflection will occur at the interface between the semiconductor and the air. Only a small part of the light on the surface of the untreated semiconductor LED structure escapes from the inside of the chip, resulting in The light extraction efficiency of the chip is very low. Since the light extraction efficiency of the chip is the main fact...

AI Technical Summary

Problems solved by technology

However, the use of photolithography technology has low production efficiency and high cost, and the lower limit of the size of the manufactured pattern will also have certain restrictions.

For example, using photolithography to manufacture nanostructures with light emitting wavelengths similar to LEDs, the cost of equipment and production will be greatly increased.

Images