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Micropore polishing method for ultraprecise optical element

An optical element and ultra-precision technology, applied in the field of polishing, can solve the problems of rough etching process, complicated protection process, and expensive cost, so as to improve the efficiency and surface quality of etching and polishing, reduce the cost of etching and polishing, and save time and equipment effects

Inactive Publication Date: 2012-06-27
西安北方捷瑞光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Dry etching often uses the DRIE method, which is complex, expensive, and low in processing efficiency.
Relatively speaking, wet etching is simple and effective, but the traditional wet etching and polishing method has low efficiency, complex protection process, rough etching process, and poor surface roughness, and there are few breakthrough research reports in this area

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] 1) Slowly add 350mL of hydrofluoric acid into 300ml of concentrated sulfuric acid, stir while mixing, until the mixed solution is cooled to room temperature, and age overnight;

[0019] 2) Slowly add 50ml of glycerin to the mixed solution in step 1), and stir well until the mixed solution is cooled to room temperature, age for 4h, and set aside;

[0020] 3) Ultrasonic cleaning the pre-polished optical components with a mixed solvent of alcohol and acetone for 10 minutes, and drying with compressed air;

[0021] 4) shield the place where the optical element cleaned in step 3) does not need to be etched and polished;

[0022] 5) Put the polishing solution prepared in step 2) in a constant temperature water bath at 25°C, immerse the optical element protected in step 4) into the polishing solution, and use magnetic stirring to make the solution flow slowly. After 25 minutes, take out the optical element, first Rinse with 3% sodium hydroxide solution, then rinse with water,...

Embodiment 2

[0026] 1) Slowly add 380mL of hydrofluoric acid into 330mL of concentrated sulfuric acid, stir while mixing, until the mixed solution is cooled to room temperature, and age overnight;

[0027] 2) Slowly add 65 ml of ethylene glycol to the mixed solution in step 1), and fully stir until the mixed solution is cooled to room temperature, age for 4 hours, and set aside;

[0028] 3) Ultrasonic cleaning the pre-polished optical components with a mixed solvent of alcohol and acetone for 10 minutes, and drying with compressed air;

[0029] 4) shield the place where the optical element cleaned in step 3 does not need to be etched and polished;

[0030] 5) Put the polishing liquid prepared in step 2) in a constant temperature water bath at 50°C, immerse the optical element protected in step 4) into the polishing liquid, use magnetic stirring to make the solution flow slowly, take out the optical element after 25 minutes, and first Rinse with 5% sodium hydroxide solution, then rinse wit...

Embodiment 3

[0034] 1) Slowly add 400mL of hydrofluoric acid into 350mL of concentrated sulfuric acid, stir while mixing, until the mixed solution is cooled to room temperature, and age overnight;

[0035] 2) Slowly add 100ml of glycerin to the mixed solution in step 1), and stir well until the mixed solution is cooled to room temperature, age for 4 hours, and set aside;

[0036] 3) Ultrasonic cleaning the pre-polished optical components with a mixed solvent of alcohol and acetone for 10 minutes, and drying with compressed air;

[0037] 4) shield the place where the optical element cleaned in step 3) does not need to be etched and polished;

[0038] 5) Put the polishing solution prepared in step 2) in a constant temperature water bath at 40°C, immerse the optical element protected in step 4) into the polishing solution, use magnetic stirring to make the solution flow slowly, take out the optical element after 20 minutes, and first Rinse with 7% sodium hydroxide solution, then rinse with w...

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Abstract

The invention discloses a micropore polishing method for an ultraprecise optical element, which includes: 1 preparing polishing liquid by means of mixing, even stirring, cooling and ageing according to a polishing liquid formula (raw materials of the formula include 350-400ml of hydrofluoric acid, 300-350ml of concentrated sulfuric acid and 50-100ml of glycerol or glycol in terms of volume ratio); 2 cleaning up the pre-polishing optical element with organic solvents mixed with acetone and then drying the pre-polishing optical element; 3 shielding positions, needing no etching and polishing, of the cleaned optical element; and 4 placing the prepared polishing liquid into a thermostat water bath at the temperature of 25-50 DEG C, soaking the optical element into the polishing liquid, stirring the polishing liquid, taking out the optical element after 20-30 minutes, firstly rinsing the optical element with 3%-7% of caustic soda solution for 3-5 minutes, then washing the optical element with pure water and finally drying the optical element. The micropore polishing method is simple in process, easy in operation and free of undercutting, production cost is reduced, production cycle is shortened, and the surface quality of micropores of the ultraprecise optical element is improved.

Description

technical field [0001] The invention relates to the technical field of polishing, in particular to a microhole polishing method for ultra-precision optical elements, which can be used for relatively high-precision polishing of through holes, blind holes, and stepped surfaces of various ultra-smooth optical elements. Background technique [0002] At present, glass micropore polishing often adopts dry / wet etching method. Dry etching often uses the DRIE method, which has a complex, expensive, and low processing efficiency. Relatively speaking, wet etching is simple and effective, but the traditional wet etching and polishing method has low efficiency, complex protection process, rough etching process, and poor surface roughness, and there are few breakthrough research reports in this area. This wet etching and polishing micropore saves the time and equipment for traditional wet etching and polishing to make mask layer and photoresist, and improves the rate of etching and polis...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B37/02C09G1/18
Inventor 张艳郭云飞马瑾
Owner 西安北方捷瑞光电科技有限公司
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