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High-entropy mixed oxide electrode material and preparing method thereof

A technology of mixed oxides and electrode materials, which is applied in the direction of circuits, capacitors, electrical components, etc., can solve problems such as limited specific capacitance, difficulty in realizing industrial production, and harsh process conditions, and achieve the effect of simple method and convenient operation

Inactive Publication Date: 2012-06-20
QUANZHOU NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But in fact, from the point of view of the prior art, using ruthenium oxide as the electrode material faces two contradictory problems: if the ruthenium oxide electrode material prepared by industrialized technical means, such as thermal spraying and plasma spraying technology, can The specific capacitance obtained is very limited, generally between 150F / g and 300F / g; if hydrothermal method, chemical precipitation method, etc. are used, although high capacitance can be achieved, there are technical problems such as complex process and harsh process conditions. It is difficult to realize industrial production, so the practicability is not strong
So far, there is no simple and effective solution to the above problems in industry

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] A high-entropy mixed oxide electrode material in this embodiment is composed of a metal titanium conductive substrate and a high-entropy mixed oxide thin film. The high-entropy mixed oxide film is composed of: 10 mol% of ruthenium oxide, 10 mol% of manganese oxide, 20 mol% of tin oxide, 20 mol% of tantalum oxide, 10 mol% of cobalt oxide, 5 mol% of zirconia, 20 mol% of titanium oxide, and 5 mol% of antimony oxide A mixed oxide composed of these 8 oxides. Its preparation method comprises the following steps:

[0016] 1) Ruthenium trichloride (10% by mole), manganese chloride (10% by mole), tin tetrachloride or tin protochloride (20% by mole), tantalum pentachloride (20% by mole) , cobalt chloride (10% by mole), zirconium chloride (5% by mole), titanium trichloride (20% by mole), and antimony trichloride (5% by mole) are dissolved in ethanol solution, and ultrasonic Oscillation is uniform, the total metal ion concentration in the solution is controlled at 0.2mol / L, and a...

Embodiment 2

[0019] A high-entropy mixed oxide electrode material in this embodiment is composed of a metal nickel conductive substrate and a high-entropy mixed oxide thin film. The high-entropy mixed oxide film is composed of: 20 mol% of ruthenium oxide, 20 mol% of manganese oxide, 5 mol% of tin oxide, 5 mol% of tantalum oxide, 20 mol% of cobalt oxide, 20 mol% of zirconia, 5 mol% of titanium oxide, and 5 mol% of antimony oxide A mixed oxide composed of these 8 oxides. Its preparation method comprises the following steps:

[0020] 1) Ruthenium trichloride (20% by mole), manganese chloride (20% by mole), tin tetrachloride or tin protochloride (5% by mole), tantalum pentachloride (5% by mole) , cobalt chloride (20% by mole), zirconium chloride (20% by mole), titanium trichloride (5% by mole), and antimony chloride (5% by mole) are dissolved in ethanol solution, and ultrasonic vibration is used uniform, the total metal ions in the solution are controlled at a concentration of 0.3 mol / L, and...

Embodiment 3

[0023] A high-entropy mixed oxide electrode material in this embodiment is composed of a metal tantalum conductive substrate and a high-entropy mixed oxide thin film. The high-entropy mixed oxide film is composed of: 30 mol% of ruthenium oxide, 5 mol% of manganese oxide, 10 mol% of tin oxide, 10 mol% of tantalum oxide, 5 mol% of cobalt oxide, 10 mol% of zirconia, 10 mol% of titanium oxide, and 20 mol% of antimony oxide A mixed oxide composed of these 8 oxides. Its preparation method comprises the following steps:

[0024] 1) Ruthenium trichloride (30% by mole), manganese chloride (5% by mole), tin tetrachloride or tin protochloride (10% by mole), tantalum pentachloride (10% by mole) , cobalt chloride (5% by mole), zirconium chloride (10% by mole), titanium trichloride (10% by mole), and antimony chloride (20% by mole) are dissolved in ethanol solution, and ultrasonic vibration is used uniform, the total metal ions in the solution are controlled at a concentration of 0.4 mol / ...

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Abstract

The invention discloses a high-entropy mixed oxide electrode material and a preparing method thereof, which relate to oxide materials and a process for material preparation. The high-entropy mixed oxide electrode material is composed of a metal conductive substrate and an oxide film, wherein the oxide film is of a high-entropy structure and is a high-entropy mixed oxide film formed by ruthenium oxide, manganese oxide, stannic oxide, tantalum oxide, cobalt oxide, zirconium oxide, titanium oxide and antimony oxide. The preparing method includes steps of brush coating, drying, thermal oxidation treatment and cooling. The high-entropy mixed oxide electrode material has high specific capacitance and is suitable for preparing high-performance super-capacitors. In addition, the method for preparing the high-entropy mixed oxide electrode material is simple in process, convenient to operate and suitable for being applied to large-scale production.

Description

technical field [0001] The invention relates to a high-entropy mixed oxide electrode material and a preparation method thereof. The oxide electrode material is mainly used in electrochemical capacitors as energy storage electrodes. Background technique [0002] Ruthenium oxide has a high theoretical specific capacitance, which is theoretically believed to be above 1300F / g, and is generally considered to be one of the ideal electrode materials for electrochemical capacitors. But in fact, from the point of view of the prior art, using ruthenium oxide as the electrode material faces two contradictory problems: if the ruthenium oxide electrode material prepared by industrialized technical means, such as thermal spraying and plasma spraying technology, can The specific capacitance obtained is very limited, generally between 150F / g and 300F / g; if hydrothermal method, chemical precipitation method, etc. are used, although high capacitance can be achieved, there are technical probl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01G9/042
Inventor 吴允苗
Owner QUANZHOU NORMAL UNIV
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