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Double-rail double-drive-based three-beat double-workpiece bench exchange apparatus and method thereof

A technology of double workpiece table and exchange device, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve the problems of less movement beat, large reaction force of abutment, increased time for table change, etc., and achieves table change time Short, fast driving speed, small mass and inertia effect

Inactive Publication Date: 2014-02-19
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the patent CN101201555, the conveyor belt and the docking slider are used to complete the stage changing process, the movement rhythm is small, and the operation and maintenance are simple. However, the conveyor belt mechanism and the docking slider are fixed on the abutment, so there will be a large force during the stage changing process On the abutment, it has a great influence on the overall dynamic performance
In the patent CN1485694, the table-changing operation is completed by the docking of the Y-direction linear motor and the linear guide rail. However, due to the excessive gap in the middle of the abutment, a bridging device is introduced, which increases the movement rhythm and increases the time for table-changing. At the same time, the X-direction linear motor magnetically The steel part is fixed on the abutment, and the movement of the moving parts will generate a large reaction force on the abutment when the platform is changed, which in turn affects the dynamic performance of the entire system
In the patent CN101770181, the docking of the replacement unit is used to complete the work of changing the platform, but the guide device is fixed on the abutment. During the movement of changing the platform, the moving parts will generate a large reaction force on the abutment, which in turn affects the dynamic performance of the entire system.
Therefore, the current dual-platform solution needs to be improved.

Method used

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  • Double-rail double-drive-based three-beat double-workpiece bench exchange apparatus and method thereof
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  • Double-rail double-drive-based three-beat double-workpiece bench exchange apparatus and method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] A three-beat double worktable exchange device based on double guide rails and double drives, the system includes a base 1, a first workbench 3a set on the base 1 and running on the exposure station and a pre-alignment station The second workpiece table 3b is characterized in that: the exposure station of the base 1 is provided with the first static pressure air bearing guide rail 4a in the X direction, the first linear motor stator 4b in the X direction, and the first linear motor mover in the X direction 4e, the X-direction second static pressure air bearing guide rail 4c, the X-direction second linear motor stator 4d, and the X-direction second linear motor mover 4f constitute the X-direction first linear motion unit 4, and the X-direction first linear motion unit 4 The unit 4 is provided with the first linear motor mover 5a in the Y direction, the first linear motor mover 2 5d in the Y direction, the first linear motor stator 5b in the Y direction, and the first stati...

Embodiment 2

[0034] Removing the X-direction second linear motor 4d, X-direction fourth linear motor 7d, Y-direction first transition linear motion unit 10 and Y-direction second linear motion unit 11 in the X-direction linear drive unit in Embodiment 1 can be implemented Example 2, such as Figure 7 shown. The station exchange process of the two workpiece platforms in embodiment 2 is exactly the same as in embodiment 1. The difference is that the X-direction driving form of the two workpiece tables is driven by a double guide rail and a single motor. Compared with Embodiment 1, the problem of inconsistency in driving the dual motors in the X direction can be avoided under the premise of ensuring the angular rigidity of the X direction movement. At the same time, due to the removal of the transitional linear motion unit, the range of motion of the double workpiece table increases, but the size of the X-direction linear motor increases.

Embodiment 3

[0036] Remove the X-direction second linear motor 4d, the X-direction second static pressure air bearing guide rail 4c, the X-direction fourth linear motor 7d, the X-direction fourth static pressure air bearing guide rail, and the X-direction linear drive unit in the first embodiment. The first transition linear motion unit 10 in Y direction and the second linear motion unit 11 in Y direction can obtain embodiment 3, such as Figure 8 shown. The station exchange process of the two workbenches in embodiment 3 is exactly the same as that in embodiment 1. Compared with Embodiment 1, Embodiment 3 reduces the number of the X-direction second linear motor 4d, the X-direction second static pressure air bearing guide rail 4c, the X-direction fourth linear motor 7d, and the X-direction fourth linear motor 7d in the X-direction linear drive unit. Four static pressure air bearing guide rails, the first transition linear motion unit 10 in the Y direction and the second linear motion unit...

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Abstract

The invention which relates to a double-rail double-drive-based three-beat double-workpiece bench exchange apparatus and a method thereof belongs to the technical field of semiconductor manufacturing equipment. The apparatus is characterized in that: the apparatus comprises workpiece benches which operate on a prealigned station and an exposure station; the prealigned station and the exposure station are respectively provided with a well type driving unit which comprises a two side X-directional liner motion unit and a two side Y-directional liner motion unit; two Y-directional transitional liner motion units are arranged between the two well type driving units; and the bench replacement of the double-workpiece bench is completed through the butt joint of the Y-directional liner motion unit and the X-directional liner motion unit. According to the invention, the two workpiece benches are driven in the prealigned station and the exposure station in a dual side mass center mode, so the system angle rigidity is increased; only three beats are needed to exchange the two workpiece benches between the prealigned station and the exposure station, so the lithography efficiency is improved; and the apparatus has the advantages of small motion inertial, short stable time, large structure rigidity and the like in the concrete embodiment process.

Description

technical field [0001] The invention belongs to semiconductor manufacturing equipment, and mainly relates to a three-beat double-workpiece table exchange device and method based on double guide rails and double drives. Background technique [0002] The lithography machine is one of the important ultra-precision system engineering equipment in semiconductor chip manufacturing. As the current mainstream lithography technology, the step-and-scan type puts forward higher requirements for the motion performance of the workpiece table. The main function of the workpiece table is to carry the wafer under the condition of high speed and high acceleration to achieve nanoscale positioning, complete the processes of loading and unloading, pre-alignment, and alignment in the photolithography process, and cooperate with the mask table to complete the exposure action. Worktable technology plays a vital role in improving the resolution, overlay accuracy and productivity of lithography mach...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 谭久彬马伟崔继文金国良
Owner HARBIN INST OF TECH
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