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Preheating device for chemical vapor deposition furnace

A chemical vapor deposition and preheating device technology, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of short heat conduction time, inability to form an effective gas field, and limited gas preheating capacity. , to achieve the effect of expanding the thermal radiation capacity, densifying the carbon disk column, and reducing the probability of axial backmixing

Active Publication Date: 2012-02-29
XIAN AVIATION BRAKE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the shortcomings of heat radiation and heat conduction in the prior art, the limited preheating ability of the gas, and the inability to form an effective gas field, the present invention proposes a chemical vapor deposition furnace preheating device

Method used

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  • Preheating device for chemical vapor deposition furnace
  • Preheating device for chemical vapor deposition furnace
  • Preheating device for chemical vapor deposition furnace

Examples

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Embodiment Construction

[0016] This embodiment is a chemical vapor deposition furnace preheating device, which includes a disturbance panel 3 , an air flow plate 4 and a base 5 .

[0017] The base 5 is placed on the upper surface of the base 7 . The air flow plates 4 are stacked layer by layer on the upper surface of the base 5, and the layers are staggered at 180°; the number of layers of the air flow plates 4 is proportional to the gas flow rate entering the deposition furnace, which is 2 to 5 layers. When the gas flow rate is ≤2000L / h, the number of layers of air flow plate 4 is 2 layers; when the gas flow rate is 2000L / h~3000L / h, the number of layers of air flow plate 4 is 3 layers; when the gas flow rate is ≥3000L / h , the number of layers of the airflow plate 4 is 4 layers or 5 layers. In this embodiment, the air flow plate 4 has three layers. The disturbance panel 3 is placed on the upper surface of the top airflow panel 4 . The prefabricated body 2 is placed on the upper surface of the dist...

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Abstract

The invention discloses a preheating device for a chemical vapor deposition furnace. Air flow plates which are arranged in parallel so as to increase air processes and prolong heating time, and beams are arranged simultaneously so as to improve heat radiation capacity; therefore, the aims of fully and uniformly preheating organic air can be fulfilled. An outlet is provided with disturbance holes which are positioned on the same circumference; and a certain included angle is formed between the axial direction of the disturbance holes and a horizontal plane; after preheated air enters the disturbance holes, the preheated air is forced to be sprayed along the axial direction of the disturbance holes to form strong rotation air flow under the collision action of disturbance walls, and organic air which is decomposed in advance forms macromolecules under the actions of centrifugal force and polymerization along with the rising of the rotation air flow; and the macromolecules preferentially enter the bottom of a stock column under the double actions of inertia force and centrifugal force, so axial back mixing probability is reduced, the macromolecules are diffused and deposited in a prefabrication body to achieve the effect of densifying the bottom, the air which is not decomposed rises continuously to ensure that top pressure and air pressure are reduced, and finally the aims of densifying the whole carbon disc stock column can be fulfilled.

Description

technical field [0001] The invention belongs to the technical field of chemical vapor deposition, in particular to a preheating device for chemical vapor deposition used for manufacturing carbon brake discs. Background technique [0002] Chemical Vapor Deposition (CVD) is a preparation method for gaseous substances to obtain solid deposits through high-temperature chemical reactions. More than 80% of the carbon brake discs currently in use are obtained through this technology. The process is described as follows: Organic gas (methane, propane, propylene, etc.) enters the deposition furnace through the gas supply device, cracks and polymerizes at a certain high temperature, and continuously diffuses and infiltrates into the disk-shaped preform, and finally forms pyrolytic carbon It is deposited on the prefabricated fiber to achieve the effect of densification and obtain a carbon / carbon composite brake disc. One of the key factors is that the organic gas must reach the proper...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/455C23C16/26
Inventor 王小宪张小伟卢刚认刘海平张正参
Owner XIAN AVIATION BRAKE TECH
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