Adaptive centering wave aberration detection method of projection lens in mask aligner

A detection method and technology of projection objective lens, applied in the field of lithography machine, can solve problems such as limited application

Active Publication Date: 2013-05-08
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

However, this method requires strict knowledge of the position of the measured spatial image, which puts forward high requirements for alignment, which limits the application of this method in actual measurement

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  • Adaptive centering wave aberration detection method of projection lens in mask aligner
  • Adaptive centering wave aberration detection method of projection lens in mask aligner
  • Adaptive centering wave aberration detection method of projection lens in mask aligner

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Embodiment Construction

[0083] The present invention will be further described below in conjunction with the examples and drawings, but the examples should not limit the protection scope of the present invention.

[0084] see first figure 1 , figure 1 It is a structural schematic diagram of the photolithography machine in the present invention. As can be seen from the figure, the lithography machine applicable to the present invention includes an illumination source 1, an illumination system 2, a test mask 3, a mask table 4 carrying the test mask 3, a test mark 5 on the test mask, a projection objective lens 6, and a workpiece Table 7, an aerial image sensor 8 installed on the workpiece table, and a data processing computer 9 connected to the workpiece table. The aerial image sensor can scan the aerial image and collect aerial image data within the range indicated by the dotted line box in the figure. The spatial image sensor adopted in the present invention has its own universal data interface, w...

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Abstract

An adaptive centering wave aberration detection method of projection lens in a mask aligner comprises the following steps of: firstly acquiring a space image to be detected, then obtaining a major constituent and a regression matrix corresponding to the space image to be detected, followed by the interpolation of the major constituent; carrying out cutting of the space image to be detected, and passing through a crude centering flow, a position estimate determination flow of the space image to be detected and a fine centering flow to obtain a coefficient of the major constituent correspondingto the space image to be detected; and adopting least spuares to obtain the wave aberration of the projection lens according to the regression matrix and major constituent coefficient. According to the invention, large eccentricity space image can be processed adaptively, thus reducing the mask aligner alignment requirement and raising the repeatability of the wave aberration detection of the projection lens in the mask aligner.

Description

technical field [0001] The invention relates to a lithography machine, in particular to an adaptive centering method for detecting wave aberration of a projection objective lens of a lithography machine. Background technique [0002] The projection objective lens is one of the core components of the lithography machine. The wave aberration of the projection objective lens will cause the deterioration of the image quality and the reduction of the process window, thereby reducing the yield. As the feature size of lithography continues to decrease, the aberration tolerance of the projection objective lens of the lithography machine becomes more and more stringent. The detection requirements for wave aberration of lithographic projection objective extend from low-order aberration to high-order aberration. Under this premise, it is more important to develop in-situ detection technology that can detect low-order and high-order wave aberration with high precision. . [0003] Due...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G01M11/02
Inventor 闫观勇王向朝杨济硕徐东波段立峰
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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