Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Active shock absorption and vibration isolation device

An active shock absorption and vibration isolation technology, applied in the direction of non-rotational vibration suppression, can solve the problem of ignoring the nonlinear factors of damping, and achieve the effect of improving dynamic characteristics, increasing aerodynamic response speed, and increasing response speed

Active Publication Date: 2011-11-09
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF7 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the device is designed based on the linear damping technique, ignoring the nonlinear factors of realizing the damping itself and the influence of nonlinear damping

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Active shock absorption and vibration isolation device
  • Active shock absorption and vibration isolation device
  • Active shock absorption and vibration isolation device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] In order to make the purpose and features of the present invention more comprehensible, the specific implementation manners of the present invention will be further described below in conjunction with the accompanying drawings.

[0030] Before describing the shock-absorbing and vibration-isolating device of the present invention, a kind of vibration-isolating device based on ceiling damping control technology is described first, and its structural schematic diagram is as follows figure 1 shown. figure 1Among them, the vibration isolation device includes a base 100 , a driving force actuator 101 , a damping force controller 102 , a speed sensor 103 , a vibration isolation platform 104 and a pneumatic vibration isolation actuator module 107 . Wherein, the base 100 is disposed opposite to the vibration isolation platform 104 , and the base 100 has ground noise or vibration interference from other power equipment, which has a non-negligible impact on the vibration isolation...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an active shock absorption and vibration isolation device. In the device, a speed signal of an object which is subjected to vibration isolation is converted into a ceiling damping force signal to act on the object which is subjected to the vibration isolation by the technology of non-linear fractional order ceiling damping control to achieve the vibration isolation effect of the low-vibration transmissibility and high attenuation ratio of the object which is subjected to the vibration isolation; and thus, the robustness of damping control can be improved, and the dynamic characteristic of shock absorption and vibration isolation device can be improved.

Description

technical field [0001] The invention relates to the technical field of active shock absorption and vibration isolation, in particular to an active shock absorption and vibration isolation device. Background technique [0002] In large-scale semiconductor integrated circuit production equipment, such as lithography machines, the vibration interference of many important components such as laser interferometer measurement systems and exposure systems is required to be as small as possible, so that important modules are in a quiet environment. Because the vibration interference will be transmitted to the measurement frame, causing unnecessary movement of the measurement frame, which will interfere with the laser interferometer measurement system of the workpiece stage mask stage and the like. Eventually, it will affect the workpiece stage, mask stage and mirror surface errors, resulting in increased overlay errors and feature line width errors. Therefore, in semiconductor equip...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): F16F15/02
Inventor 吴立伟陈锐李志龙
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products