Preparation method of soft template in lattice structure for ultraviolet nano imprinting

Abstract

A preparation method of a soft template in a lattice structure for ultraviolet nano imprinting in the technical field of nano imprinting, comprising the following steps of: with a porous aluminum template as a parent plate, stirring a polydimethylsiloxane base material and a curing agent according to a proportion and then adding silicon oil to prepare a polydimethylsiloxane diluent; under vacuum conditions, adding the polydimethylsiloxane diluent onto the surface of the parent plate via a needle tube and throwing gel after the surface is completely covered; further covering the polydimethylsiloxane base material and the curing agent on the surface of the parent plate after a gel homogenizing process; and heating and solidifying the parent plate after being vacuumized to prepare the soft template in a lattice structure for ultraviolet nano imprinting. By diluting polydimethylsiloxane with the silicon oil to reduce the coefficient of viscosity of the polydimethylsiloxane, the invention ensures that the polydimethylsiloxane can enter holes of less than 100nm in size to transfer figures.

Description

Technical field [0001] The invention relates to a method in the technical field of nanoimprinting, in particular to a method for preparing a soft template of a lattice structure with a characteristic scale of 100 nanometers and below. Background technique [0002] In recent years, with the rapid development of nano-processing technology and nano-materials, the molding of micro-nano structures has received more and more attention. In February 2003, Technology Review reported the top ten emerging technologies that changed the world, one of which was Nanoimprint Lithography. Nano-imprint technology uses a template with nano-patterns to imprint on the photoresist, transfer the nano-patterns on the template to the photoresist on the surface of the substrate, and then transfer the patterns on the photoresist by an etching process The process to the substrate, including hot embossing technology (HEL—Hot Embossing Lithography); Micro-Contact Printing (MCP); Roller Nanoimprint Lithograph...

AI Technical Summary

Problems solved by technology

[0004] In fact, it has been proved by experiments that the traditional liquid casting method cannot allow PDMS to realize the effective transfer of graphics when transferring the lattice structure with a pore size below 100 nanometers.

The fundamental reason is that due to the high viscosity of PDMS (45 Pascal.s at room temperature), it is impossible to freely enter pores with a scale of 100 nanometers and below through capillary action, and cannot effectively transfer nanoscale graphics on the master, so it is impossible to prepare Soft templates with patterns for subsequent UV nanoimprinting

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