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Standard complementary metal oxide semiconductor (CMOS) process-based color image sensor

A color image and color technology, applied in the field of metal grating color image sensor and semiconductor CMOS image sensor, can solve the problems that limit the high integration and low cost of semiconductor color image sensor, achieve low cost, high integration, and realize noise elimination Effect

Active Publication Date: 2013-03-20
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these color image sensors need to add other processes on the basis of standard CMOS processes or non-standard CMOS processes that require adjustment of process parameters
The main disadvantages of these complex processes limit the development of high integration and low cost of semiconductor color image sensors

Method used

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  • Standard complementary metal oxide semiconductor (CMOS) process-based color image sensor
  • Standard complementary metal oxide semiconductor (CMOS) process-based color image sensor
  • Standard complementary metal oxide semiconductor (CMOS) process-based color image sensor

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Embodiment Construction

[0028] see figure 1 As shown, the present invention provides a kind of color image sensor based on standard CMOS process, comprising:

[0029] A color pixel unit array 10 is used to collect the original information of the incident light, and convert the collected color image optical signal into an electrical signal; the color pixel unit array 10 is arranged in a Bayer mosaic pattern, and each color pixel unit 21 It includes four metal grating photodiode units 221, which are one red, two green, and one blue metal grating filter unit. The metal grating photodiode unit 221 consists of a CMOS process photodiode layer 223 and a two-dimensional metal grating layer 224 Composed, the metal grating photodiode unit 221 is directly formed on the photodiode layer 223 by a two-dimensional metal grating layer 224, the two-dimensional metal grating layer 224 is composed of the first metal layer of the standard process used, and the period value of the metal grating is given by The grating i...

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PUM

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Abstract

The invention discloses a standard complementary metal oxide semiconductor (CMOS) process-based color image sensor, which comprises a color pixel unit array, a noise removing module, a cache, a digital controller and an analog-digital converter, wherein an analog input end of the noise removing module is connected with an output end of the color pixel unit array; an input end of the cache is connected with an output end of the noise removing module, and the cache is used for caching an output signal of the noise removing module and performing parallel / series conversion; a first output end of the digital controller and a first output end of a digital processor are connected with an input end of the color pixel unit array; a second output end of the digital controller is connected with a digital input end of the noise removing module; a digital control end of the digital processor is connected with a fourth output end of the digital controller; the digital processor is used for processing a digital image signal output by the analog-digital converter and converting the signal into image information for output; an analog input end of the analog-digital converter is connected with an output end of the cache and a digital input end of the analog-digital converter is connected with a third output end of the digital controller; the output end of the analog-digital converter is connected with an analog input end of the digital processor; and the analog-digital converter is used for converting an analog signal which is output by the cache into a digital signal.

Description

technical field [0001] The invention relates to the technical field of semiconductor CMOS image sensors, in particular to the technical field of a metal grating color image sensor based on a standard CMOS process. Background technique [0002] Semiconductor color image sensors have been developing toward high integration and low cost, and have a huge market demand. At present, the most widely used semiconductor color image sensors include color filter array (CFA-Color Filter Array) image sensor, thin film technology (TFA-Thin film on ASIC) image sensor and filterless color CMOS image sensor under Foveon X3 technology ( FCS-Filterless Color Sensor). [0003] The color filter image sensor and the thin-film technology image sensor add a Bayer filter to the photosensitive unit. Color filter optics used to select the desired radiation band fall into two categories: color filters and thin-film filters. Color filters are sheets of flat glass or gelatin of various colors. Thin-f...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H04N5/357H04N5/374H04N5/3745
Inventor 付秋瑜吴南健林清宇
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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