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Preparation process of photo-resist cleaning liquid

A preparation process and cleaning fluid technology, applied in the direction of photosensitive material processing, etc., can solve the problems of low production capacity and difficult to control the cleanliness of photoresist cleaning fluid, so as to improve production efficiency and production capacity, improve product competitiveness, and reduce production costs. Effect

Inactive Publication Date: 2011-07-06
ANJI MICROELECTRONICS (SHANGHAI) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] The technical problem to be solved by the present invention is to overcome the defects of the existing photoresist cleaning solution preparation process, such as too long process time, low production capacity, and difficult control of the cleanliness of the photoresist cleaning solution, and to provide a photoresist cleaning solution The preparation process, which adopts a parallel process, has the effects of shortening the process time, improving production efficiency and production capacity, and easy control of cleanliness

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] Example 1 Preparation process of a novel photoresist cleaning solution with high cleanliness The preparation process:

[0046] (1) Confirm that all raw materials have passed the test and are in place; check and correct the measurement equipment, production equipment, and pure water supply system to ensure that they meet the specifications and requirements;

[0047] (2) Intermediate premix 1: Add 1030 kg of dimethyl sulfoxide, 900 kg of pure water and 750 kg of dipropylene glycol methyl ether into the finished product mixing tank through the feeding system, and turn on until the mixing is uniform, and the total number of particles is detected (LPC) and trace metal ion residues are tested for use;

[0048]Intermediate premix 2: Add 200 kilograms of triethylamine to the mixing tank 1, add 120 kilograms of pentamethyldiethylenetriamine at a stirring speed of 120 rpm, stir until the mixture is uniform, and continue to stir Slowly add 50 kg of iminodiacetic acid at low tempe...

Embodiment 2

[0053] Example 2 Preparation process of a novel photoresist cleaning solution with high cleanliness Preparation process:

[0054] (1) Confirm that all raw materials have passed the test and are in place; check and correct the measurement equipment, production equipment, and pure water supply system to ensure that they meet the specifications and requirements;

[0055] (2) Intermediate premix 1: Add 1030 kg of dimethyl sulfoxide, 900 kg of pure water and 750 kg of dipropylene glycol methyl ether to the finished product mixing tank through the feeding system, stir and mix evenly, slowly add 140 kg of 40% fluorine Aqueous solution of ammonium chloride, stirred until the mixture is completely uniform, after passing the detection of the total number of large particles, trace metal ion residues and fluoride ion concentration, it is ready to use;

[0056] Intermediate premix 2: Add 200 kilograms of triethylamine to the mixing tank 1, add 120 kilograms of pentamethyldiethylenetriamine...

Embodiment 3

[0060] Example 3 Preparation process of a novel photoresist cleaning solution with high cleanliness Preparation process:

[0061] (1) Confirm that all raw materials have passed the test and are in place; check and correct the measurement equipment, production equipment, and pure water supply system to ensure that they meet the specifications and requirements;

[0062] (2) Intermediate premix 1: Add 1030 kg of dimethyl sulfoxide, 900 kg of pure water and 750 kg of dipropylene glycol methyl ether into the finished product mixing tank through the feeding system, and turn on until the mixing is uniform, and the total number of particles is detected (LPC) and trace metal ion residues are tested for use;

[0063] Intermediate premix 2: Add 200 kilograms of triethylamine to the mixing tank 1, and add 120 kilograms of pentamethyldiethylenetriamine at a stirring speed of 120 rpm, and stir until uniformly mixed. It is ready to be used after the detection of the total number of particle...

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Abstract

The invention discloses a preparation process for a photo-resist cleaning liquid, which is characterized by comprising the following steps of: grouping components of the photo-resist cleaning liquid according to working principle, function, physical and chemical properties or coexisting stability; mixing each group of components in parallel to obtain intermediate pre-mixtures; controlling and detecting the quality of the intermediate pre-mixtures; and after all the intermediate pre-mixtures are qualified, mixing the pre-mixtures to obtain the photo-resist cleaning liquid. The preparation process in the invention greatly reduces the process flow time of production in large scale and greatly improves output; the process provided by the invention also reduces production cost, increases process quality control points, and improves quality control level so as to greatly enhance product quality guarantee and lower the risk of production quality accidents; therefore, the process has obvious economic value.

Description

technical field [0001] The invention relates to a preparation process of a photoresist cleaning solution. Background technique [0002] The preparation of photoresist cleaning solution used in the photolithography process of semiconductor processing usually adopts a small-scale and low-efficiency sequential feeding preparation method. The process is as follows: [0003] In the reaction vessel, through the feeding pipe (port), the required components are added sequentially. After all the feeding is completed and mixed evenly, the sampling measurement of the quality control point is carried out, such as the content of key components, the number of particles, trace metal ion residues, etc. [0004] The shortcoming of above-mentioned preparation technique is: [0005] 1. The process time is too long: the entire production cycle is the accumulation of all the operation process time, and the efficiency is low, which will lead to low production capacity of the production line; ...

Claims

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Application Information

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IPC IPC(8): G03F7/42
Inventor 朱杰胡建华
Owner ANJI MICROELECTRONICS (SHANGHAI) CO LTD
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