Method for positioning low impedance tiny flaws in comb metal wire structure
A metal wire, low-impedance technology, applied in the field of failure analysis and positioning, can solve the problem of not finding defects, achieve fast positioning, high efficiency, and save manpower
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[0016] Such as Figure 6 The illustrated invention comprises the following steps:
[0017] Step 1. If figure 1 As shown, the focused particle beam electron microscope FIB is used to perforate the silicon substrate (the silicon substrate is usually the ground terminal), and the platinum-plated metal layer of the focused particle beam electron microscope FIB is used to connect one end of the comb line to the substrate to achieve grounding.
[0018] Step 2. If figure 2 As shown, the comb line is divided into n times, and each time is divided into a voltage contrast VC inspection, and each time the voltage contrast VC can locate the defect within half of the original area, n times After equal division, the defect will be located within the area range of 1 / 2 to the nth power.
[0019] Step 3. If image 3 As shown, in the small area positioned, the defects buried by the insulating film can be observed by scanning the scanning electron microscope SEM with a high accelerating vol...
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