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Annular light source test platform

A platform and light source technology, applied in the field of electromechanical, can solve problems such as damage to the reticle, and achieve the effect of improving the quality and improving the quality of the reticle.

Inactive Publication Date: 2011-04-13
GUDENG PRECISION IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Solve the problem that during the inspection, the inspector puts the mask under the light source and flips the angle to obtain the best viewing angle. Since the mask is clamped by the inspector, it may cause damage to the mask due to improper operation of the personnel

Method used

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Embodiment Construction

[0024] In order to achieve the above-mentioned purpose and effect, the technical means and structure adopted by the present invention, the features and functions of the preferred embodiments of the present invention will be described in detail as follows in order to facilitate a complete understanding.

[0025] as attached figure 1 with attached figure 2 As shown, it is a perspective view and a three-dimensional exploded view of a preferred embodiment of the present invention, and it can be clearly seen that the present invention includes:

[0026] The supporting frame 1, the supporting frame 1 includes a supporting platform 11 for fixedly placing a preset photomask 13 and a support 12 supporting the supporting platform 11, the supporting frame 12 can freely rotate or move the supporting platform up and down. Set platform 11, between this bearing platform 11 and this support 12 is provided with an adjusting member that can make this bearing platform 11 rotate freely and can ...

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Abstract

The invention discloses an annular light source test platform, which belongs to electromechanics. The annular light source test platform comprises a bearing frame and a plurality of lighting pieces, wherein the bearing frame comprises a bearing platform and a bracket, wherein the bearing platform can be used for fixedly placing a preinstalled photomask; the bracket supports the bearing platform; the lighting pieces are a certain distance from the bearing frame and are arranged on the bearing frame in a surrounding way; and each of the lighting pieces is arranged towards the bearing frame. By using the structure, not only a falling risk which is possible to be caused by artificially gripping the photomask is improved, but also multi-angle test can be provided, so that the lighting quality can be improved and a visual dead angle is avoided.

Description

technical field [0001] The invention relates to electromechanical devices, and aims to provide a ring-shaped light source inspection platform, especially a ring-shaped light source inspection platform that can effectively inspect particles on a photomask to improve the quality of inspection objects. Background technique [0002] Wafers are the most important material for manufacturing semiconductors, and the main raw material for manufacturing wafers is silicon dioxide. The wafers undergo hundreds of processing procedures such as deposition, etching, heating, photoresist treatment, coating, and development. A single wafer can produce tens or even hundreds of integrated circuit semiconductors according to its different sizes, and in order to produce wafers with different circuits and electronic components, a photomask is required for pre-design. [0003] A photomask can be said to be a mold for making a wafer. When an integrated circuit company designs a circuit design for a ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/88G01N21/01
Inventor 陈俞铭
Owner GUDENG PRECISION IND CO LTD
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