Transparent electropane and manufacturing method thereof
A technology of transparent conductive film and manufacturing method, which is applied in the field of transparent conductive film glass and its manufacturing, and can solve the problems of poor uniformity of resistance value of transparent conductive film glass square, low transmittance of transparent conductive film glass, high haze of transparent conductive film glass, etc. Problems, to achieve superior shielding effect, low cost, high production efficiency
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[0022] In order to make the technical problems to be solved, technical solutions and beneficial effects of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0023] see Figure 1 to Figure 3 , the transparent conductive film glass has a glass substrate 1, a silicon film 2 deposited on the surface of the glass substrate 1, and an aluminum-doped zinc oxide transparent conductive film 3 deposited on the surface of the silicon film 2.
[0024] The thickness of the silicon film 2 is 30-150nm, wherein the mass percentage of elemental silicon is 97%-99.5%, the mass percentage of aluminum is 0.5%-3%, and the thickness of the aluminum-doped zinc oxide transparent conductive film 3 is 300nm -3 μm, wherein the mass percentage of ...
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