Green carbon dioxide supercritical fluid semiconductor cleaning equipment
A supercritical fluid, carbon dioxide technology, applied in semiconductor/solid-state device manufacturing, cleaning methods and utensils, chemical instruments and methods, etc., can solve the problems of cleaning a lot of water, pollute the environment, particle adsorption, etc. Enhance safety and reduce pollution
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[0034] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0035] Such as figure 1 as shown, figure 1 Schematic diagram of the structure of the carbon dioxide superfluid semiconductor cleaning equipment provided by the present invention. The equipment is mainly composed of a working chamber 1, a separation chamber 3, a cleaning agent and co-solvent temporary storage tank 4, a temperature and pressure control system 7 and a carbon dioxide cycle control system 8. Wherein, both the main working chamber 1 and the separation chamber 3 are fixed on the support 10 .
[0036] The main working chamber 1 is connected to the carbon dioxide storage tank through the main chamber liquid inlet pipe 103 with the liquid inlet solenoid valve 102, and is connected with the separation chamber 3 thr...
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