Method for preparing hollow mesoporous lamella spherical silica material
A technology of spherical silicon oxide and empty mesopores, applied in the direction of silicon oxide, silicon dioxide, etc.
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Embodiment 1
[0029] At room temperature, add 2g PS spheres into a mixed solution of 30mL ethanol and 25g water, ultrasonically disperse for 15min, add 0.625g CTAB, stir for 30min, add ammonia water (28wt%) 3mL, continue stirring for 5min, add 2mL TEOS, stir at room temperature React for 2 hours, centrifuge to obtain a white powder, wash with water and ethanol three times, and dry in a 50°C oven for 24 hours. The dried sample is raised from room temperature to 550°C at a rate of 1°C / min in a muffle furnace and kept for 5 hours to obtain a hollow Silica balls. The specific surface area of the obtained material is 1099m 2 / g, the average pore diameter is 2.34nm, and the pore volume is 0.63mL / g.
Embodiment 2
[0031] At 60°C, add 4g PS spheres into a mixed solution of 30mL ethanol and 25g water, ultrasonically disperse for 15min, add 0.625gCTAB, stir for 30min, add 12mL ammonia water (28wt%), continue stirring for 5min, add 2mL TEOS, and stir the reaction After 24 hours, centrifuge to obtain a white powder. After washing three times with water and ethanol, dry it in a 50°C oven for 24 hours. The dried sample is raised from room temperature to 550°C at a rate of 1°C / min in a muffle furnace and kept for 5 hours to obtain a hollow oxidized Silicon spheres.
Embodiment 3
[0033] At room temperature, add 2g PS spheres into a mixed solution of 80mL ethanol and 25g water, ultrasonically disperse for 15min, add 2.5g CTAB, stir for 30min, add ammonia water (28wt%) 3mL, continue stirring for 5min, add 1mL TEOS, stir at room temperature React for 2 hours, centrifuge to obtain a white powder, wash with water and ethanol three times, and dry in a 50°C oven for 24 hours. The dried sample is raised from room temperature to 550°C at a rate of 1°C / min in a muffle furnace and kept for 5 hours to obtain a hollow Silica balls.
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