Negative resist composition
A technology of negative resist and composition, which is applied in the direction of instruments, optomechanical equipment, coatings, etc., and can solve the problems of reduced transmittance, low thermal stability of photoresist, and contamination of liquid crystal displays, etc.
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Embodiment 1
[0040]150 ml of propylene glycol methyl ether acetate (PGMEA) was placed in a mixing chamber with a UV blocking membrane and a stirrer. According to the compositions and contents shown in Table 1 below, a binder resin, a multifunctional (meth)acryl monomer, and a photoinitiator were sequentially added. And 0.1% by weight of FC-430 (manufactured by 3M, a leveling agent) was added. Then, a negative resist composition was prepared and stirred at room temperature. Next, PGMEA was added to control the viscosity of the composition to 18 cps.
Embodiment 2-9
[0042] According to the composition and content in Table 1 below, a negative resist composition was prepared in the same manner as in Example 1.
[0043] Table 1
[0044]
[0045]
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