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A method of performing model-based scanner tuning

A scanner and imaging model technology, which can be used in instruments, photolithography process of pattern surface, microlithography exposure equipment, etc., can solve the problems of time-consuming, expensive, and achieve low-cost

Active Publication Date: 2009-02-25
ASML NETHERLANDS BV
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  • Summary
  • Abstract
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Problems solved by technology

Currently, this is usually done by a process of trial and error which, as mentioned above, is time consuming and costly

Method used

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  • A method of performing model-based scanner tuning
  • A method of performing model-based scanner tuning
  • A method of performing model-based scanner tuning

Examples

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Embodiment Construction

[0031] figure 1 is an exemplary flowchart representing the model-based scanner tuning method of the present invention. As explained in detail below, the method of the present invention allows simultaneous optimization of imaging performance and OPE matching between different lithographic systems comprising scanners for imaging the same target pattern .

[0032] refer to figure 1 , the first step in the process (step 10) is to define a test pattern for calibrating the model of the reference scanner. Suitable test patterns (also known as phantom calibration metric patterns) can be used. The test pattern employed should sufficiently represent the features to be imaged so that it is possible to generate a robust model capable of accurately predicting the imaging performance of the lithography system. Such test patterns can be easily generated / selected by one skilled in the art once the target pattern or application is determined. It should be noted that it is also possible to...

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Abstract

A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.

Description

technical field [0001] The present invention generally relates to a method and a program product for implementing model-based scanner tuning and optimization, which method and program product enable performance optimization of a multi-lithography system. Background technique [0002] A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, the mask may contain a circuit pattern corresponding to a single layer of the IC, and this pattern may be imaged onto a target portion (e.g., including a portion of the die, one or more tubes) on the substrate (silicon wafer). core), the substrate has a layer of radiation-sensitive material (resist). Typically, a single wafer will contain an entire network of adjacent target portions that are successively exposed one at a time via the projection system. In one type of lithographic projection apparatus, each target portion is irradiated by exposing the entire pattern onto the target...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70516G03F7/70125G03F7/70525G03F7/705G03F7/70458G03F7/706839G03F7/706845
Inventor 叶均曹宇
Owner ASML NETHERLANDS BV
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