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Active vibration damping system and forecast control method thereof

A technology of active vibration reduction and predictive control, applied in vibration suppression adjustment, engine frame, spring/shock absorber, etc., can solve the problems of reaction time and precision control difficulty, achieve low power, reduce overturning moment, heat generation low effect

Active Publication Date: 2009-02-11
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology

However, as the size of lithographic silicon wafers continues to increase, the load-carrying mass, motion speed, and acceleration of the mask table and workpiece table continue to increase, and it is becoming more and more difficult to use feedforward control for torque compensation in terms of response time and precision control. Big

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  • Active vibration damping system and forecast control method thereof
  • Active vibration damping system and forecast control method thereof
  • Active vibration damping system and forecast control method thereof

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Embodiment Construction

[0030] A specific embodiment of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0031] Such as figure 1 As shown, the schematic diagram of the structural frame of the active vibration reduction system for the step-and-scan lithography machine is described. It mainly includes: main substrate 1, objective lens 2, mask table 3, workpiece table 7, vibration reduction unit 4 (including 4a, 4b, 4c, three vibration reduction units, distributed in an equilateral triangle, see 4c Figure 4 ), base 6. The entire foundation frame is located on the vibration-damping foundation 5, which can effectively isolate the vibration impact generated by the surrounding environment. During the working process of the lithography machine, the mask stage 3 and the workpiece stage 7 are scanned and exposed according to the pre-planned path. Since the mask stage and the silicon wafer stage have a relatively high speed and acceleration, the moving ...

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Abstract

The invention provides an active damping system which comprises a pedestal, a main substrate, damping units and a control system and which is characterized in that: the number of the damping units is at least three; the damping units are arranged at the same included angle around a center and uniformly distributed on the same circumference; the bottom ends of the damping units are positioned on the pedestal and the top ends of the damping units are positioned on the main substrate; the control system is connected with the damping units to receive vibration signals from the damping units and feedback a control signal. According to the path planning of the moving parts such as the mask table and the working table on the main substrate, the preview control module generates the position information of each moving part within a future time period; integrates the current position information and the position information within the future time period of each moving parts; calculates a preview compensation control signal by means of the preview control algorithm; superposes the preview compensation control signal to the damping feedback control signal; and actuates the active damping system. The active damping system has the advantages of small power, low energy consumption and high damping accuracy.

Description

【Technical field】 [0001] The present invention relates to an active vibration reduction system, in particular to an active vibration reduction system using predictive control for a stepper photolithography machine 【Background technique】 [0002] The ultra-precise active damping system is the basis of many high-tech technologies and product development, so it has been highly valued by various countries. With the development of ultra-fine processing and assembly technology and ultra-precision measurement technology, the influence of micro-vibration becomes more prominent. During the working process of the step-and-scan lithography machine, due to the high motion acceleration and speed of the sub-systems of the workpiece table and the mask table, the reaction force generated by the moving parts during the motion and the overturning moment will cause the lithography machine to The core part vibrates, which affects the exposure quality. [0003] Modern step-and-scan lithography...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20F16F15/023F16M7/00
Inventor 杨辅强袁志扬严天宏刘赟周宏权
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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