Preparation for high alpha-Si3N4 phase silicon nitride
A phase silicon nitride and silicon nitride powder technology, which is applied in the field of high α-Si3N4 phase silicon nitride preparation, can solve the problems of high cost, low product quality, low output, etc., and achieves low cost, low energy consumption, high production low cost effect
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Embodiment 1
[0031] The high α-Si described in the present invention 3 N 4 Phase silicon nitride preparation method, carry out according to the following steps successively:
[0032] (1) Furnace by mixing silicon powder and silicon nitride powder evenly into briquettes, wherein the particle size of silicon powder is ≤15 μm, the particle size of silicon nitride powder is ≤2 μm, and the weight ratio of silicon powder and silicon nitride powder is: 100:8;
[0033] (2) Vacuum up to 2.0×10 -2 Pa;
[0034] (3) Charge hydrogen and nitrogen into the furnace, the charging volume ratio of hydrogen and nitrogen is: hydrogen: nitrogen=5: 100, and the firing pressure control is:
[0035] Before 1000℃, the air pressure is controlled at 10KPa;
[0036] 1000-1200℃, the air pressure is controlled at 10-30KPa (inflate when ≤10KPa, stop inflating when ≥30KPa);
[0037] 1200-1350°C, the air pressure is controlled at 20-40KPa (inflate when ≤20KPa, stop inflating when ≥40KPa).
[0038] The X-ray diffract...
Embodiment 2
[0040] The high α-Si described in the present invention 3 N 4 Phase silicon nitride preparation method, carry out according to the following steps successively:
[0041] (1) Furnace by mixing silicon powder and silicon nitride powder evenly into briquettes, wherein the particle size of silicon powder is ≤15 μm, the particle size of silicon nitride powder is ≤2 μm, and the weight ratio of silicon powder and silicon nitride powder is: 100:8;
[0042] (2) Vacuum up to 2.5×10 -2 Pa;
[0043] (3) Charge hydrogen and nitrogen into the furnace, the charging volume ratio of hydrogen and nitrogen is: hydrogen: nitrogen=7: 100, and the firing pressure control is:
[0044] Before 1000℃, the air pressure is controlled at 15KPa;
[0045] 1000-1200℃, the air pressure is controlled at 10-30KPa (inflate when ≤10KPa, stop inflating when ≥30KPa);
[0046] 1200-1350°C, the air pressure is controlled at 20-50KPa (inflate when ≤20KPa, stop inflating when ≥50KPa).
[0047] The X-ray diffract...
Embodiment 3
[0049] The high α-Si described in the present invention 3 N 4 Phase silicon nitride preparation method, carry out according to the following steps successively:
[0050] (1) Furnace by mixing silicon powder and silicon nitride powder evenly into briquettes, wherein the particle size of silicon powder is ≤15 μm, the particle size of silicon nitride powder is ≤2 μm, and the weight ratio of silicon powder and silicon nitride powder is: 10:1;
[0051] (2) Vacuum up to 1.5×10 -2 Pa;
[0052] (3) Charge hydrogen and nitrogen into the furnace, the charging volume ratio of hydrogen and nitrogen is: hydrogen: nitrogen=8: 100, and the firing pressure control is:
[0053] Before 1000℃, the air pressure is controlled at 20KPa;
[0054] 1000-1200℃, the air pressure is controlled at 10-30KPa (inflate when ≤10KPa, stop inflating when ≥30KPa);
[0055] 1200-1350°C, the air pressure is controlled at 20-60KPa (inflate when ≤20KPa, stop inflating when ≥60KPa).
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