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Flat glass substrate attenuation etching liquid

A flat glass and etching solution technology, applied in the field of flat glass thinning etching solution, to achieve the effects of increased utilization, less volatilization, and increased etching rate

Active Publication Date: 2008-07-09
BOE TECH GRP CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to provide a flat glass substrate thinning etchant, which effectively overcomes the defects caused by the use of a single hydrofluoric acid etchant in the prior art

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] The flat glass substrate thinning etchant includes the following components in weight percent: 5% hydrofluoric acid, 5% nitric acid, and 90% pure water.

[0019] At 25-30°C, the etching rate can reach about 3 microns / minute, the thickness uniformity after etching is less than 1%, the rate can be kept relatively stable within ±2% concentration deviation, and the utilization rate of etching solution is about 5%.

Embodiment 2

[0021] The etchant for thinning the flat glass substrate includes the following components in weight percentage: 15% of hydrofluoric acid, 10% of nitric acid, and 75% of pure water.

[0022] At 25-30°C, the etching rate can reach about 7 microns / minute, the thickness uniformity after etching is less than 2%, the rate can be kept relatively stable within ±1% concentration deviation, and the utilization rate of etching solution is about 15%.

Embodiment 3

[0024] The flat glass substrate thinning etchant includes the following composition components in weight percentage: 25% of hydrofluoric acid, 30% of nitric acid, and 45% of pure water.

[0025] At 25-30°C, the etching rate can reach about 10 microns / minute, the thickness uniformity after etching is less than 5%, the rate can be kept relatively stable within ±1% concentration deviation, and the utilization rate of etching solution is about 10%.

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Abstract

The invention relates to a reduction etching liquid for base plates of sheet glass, components percentage by weight of which comprise: hydrofluoric acid holding 5-25%, strong acid holding 5-30% and pure water holding 45-90%. The reduction etching liquid for base plates of sheet glass of the invention is less in volatilization and toxicity. The using rate of the etching liquid is high and etching speed is rapid and stable. Costs of waste liquor treatment and subsequent treatment are low. The etching effect is excellent. Therefore, the invention has wide prospects for application.

Description

technical field [0001] The invention relates to a flat glass thinning etchant, in particular to a flat panel display and various display modules (including LCD (liquid crystal display / screen), PDP (plasma display / screen), TP (touch screen), OLED (organic light emitting Diode display) and other display products) glass substrate thinning etchant. Background technique [0002] With the development of electronic technology and display technology, the thinning of glass substrates, as the core of thinning display products, has become the premise and driving force for thinning terminal display products. At present, the thinning technology of display product glass substrate, or its thinning technology, mainly includes physical grinding and polishing thinning and chemical etching thinning, and chemical etching thinning has technical advantages such as fast speed, high efficiency and low investment. It is gradually becoming the mainstream technology for thinning glass substrates. Ta...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
Inventor 王道鹏王乾旭李晓军关锋
Owner BOE TECH GRP CO LTD
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