AIN/Si*N* nanometer multi-layer horniness coatings as well as its preparing method

A nano-multilayer, hard coating technology, applied in the direction of coating, metal material coating process, layered products, etc., can solve the problem of low deposition efficiency of ceramic targets, long time required, and inability to use nano-multilayer coating. Industrial production, etc.

Inactive Publication Date: 2008-04-09
JIANGSU UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] However, the TiN / SiO proposed in this patent 2 Nanoscale multilayer coatings were prepared by direct sputtering of TiN and SiO in an Ar atmosphere 2 The ceramic target is obtained, because the deposition efficiency of the ceramic target is much lower than that of the metal target through the reaction gas (such as N 2 Gas) for the efficiency of reactive sputtering deposition coating, the nano-multilayer coating is also difficult to apply to industrial production
In addition, for nano-multilayer coatings composed of nitrides and oxides, although dual gas sources (that is, two reactive gases N 2 and O 2 ) method, through the continuous switching of two reactive gases to obtain nitrides and oxides respectively by reactive sputtering, but because the gas switching takes a long time, this method cannot be used in the industrial production of nano-multilayer coatings

Method used

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  • AIN/Si*N* nanometer multi-layer horniness coatings as well as its preparing method
  • AIN/Si*N* nanometer multi-layer horniness coatings as well as its preparing method

Examples

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Effect test

example 1

[0033] AlN / Si of the present invention 3 N 4 The concrete process parameter of the preparation method of multi-layer coating is Ar: gas flow is 10 sccm, N 2 The gas partial pressure is 3sccm. The Al target sputtering power is 100W, the deposition time is 33 seconds, the Si target sputtering power is 100W, the deposition time is 4 seconds, and the substrate temperature is 500°C. The resulting AlN / Si 3 N 4 The thickness of the AlN layer in the multilayer coating is 4 nm, Si 3 N 4 The layer thickness is 0.4 nm, and the hardness of the coating is 37.8 GPa.

example 2

[0035] AlN / Si of the present invention 3 N 4 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas flow rate is 10sccm, N 2 The gas partial pressure is 3 sccm. The Al target sputtering power is 100W, the deposition time is 33 seconds, the Si target sputtering power is 100W, the deposition time is 6 seconds, and the substrate temperature is 500°C. The resulting AlN / Si 3 N 4 The thickness of the AlN layer in the multilayer coating is 4 nm, Si 3 N 4 The layer thickness is 0.7 nm, and the hardness of the coating is 33 GPa.

example 3

[0037] AlN / Si of the present invention 3 N 4 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas flow rate is 4sccm, N 2 The gas partial pressure is 2 sccm. The Al target sputtering power is 100W, the deposition time is 24 seconds, the Si target sputtering power is 100W, the deposition time is 70 seconds, and the substrate temperature is 500°C. The resulting AlN / Si 3 N 4 The thickness of the AlN layer in the multilayer coating is 2.5nm, Si 3 N 4 The layer thickness is 7.5 nm and the hardness of the coating is 33 GPa.

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Abstract

The invention relates to a coating and the preparation method of the coating. The AlN / Si3N4 nano-multi-layer film of the invention, which is formed by AlN and Si3N4 on a metal or ceramic substrate, is a multi-layer structure of the alternating deposition nano meter level. The thickness of each layer ranges from 0.4 to 12.0 nm, and total thickness ranges from 1.0 to 5.0 micron. When in preparing, firstly, the surface of the metal or ceramic substrate can be polished to a mirror surface; and then, the layers of Si3N4 and the layers of AlN can be alternately deposited by using pure targets of Al and Si to conduct the dual-target RF reactive sputtering on the metal or ceramic substrate; finally, the nano-multi-layer film AlN / Si3N4 can be obtained by inletting Ar and N2 which are both in high-purity. The thickness of the nano-multi-layer film AlN / Si3N4 can be achieved by increasing the preparing cycle of the multi-layer film. The maximum hardness of the nano-multi-layer coating is 37.8 GPa, which significantly is higher than the material used for preparing the coating; the nano-multi-layer film AlN / Si3N4 provided by the invention can achieve higher production efficiency.

Description

technical field [0001] The present invention relates to a kind of coating and preparation method thereof, especially a kind of AlN / Si 3 N 4 The invention relates to a superhard nanostructure multilayer film and a preparation method thereof, which belong to the technical field of ceramic coating. Background technique [0002] The development of modern processing technology has put forward higher service requirements such as "high speed and high temperature", "high precision", "high reliability" and "long life" for tool coatings, while traditional single coatings such as TiN can no longer completely Competent for the service conditions of the tool. [0003] Existing tool coatings do not fully meet these requirements. For example, the hardness of TiN coating is HV25GPa, and the oxidation temperature is about 500°C; the hardness of TiCN coating is as high as HV40GPa, but the oxidation resistance temperature is only 400°C; the hardness of TiAlN coating is HV35GPa, and the oxid...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B33/00B32B9/00C23C14/34C23C14/02C23C14/54
Inventor 许俊华喻利花
Owner JIANGSU UNIV OF SCI & TECH
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