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Excimer lamp device

A technology for excimer lamps and lampshades, applied in lighting devices, discharge lamps, lighting applications, etc., can solve problems such as difficult substrate processing, and achieve the effects of avoiding electrode oxidation, stabilizing cleaning effect, and maintaining the lighting state

Active Publication Date: 2010-10-13
USHIO DENKI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, it is more difficult to perform stable substrate processing by controlling the relative humidity

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0104] according to figure 1 The structure makes the experimental machine of excimer lamp device (10). The specific structure of the excimer lamp device (10) is as follows.

[0105] Excimer lamps (20) have figure 2The structure shown has an outer diameter of 18.5mm, an inner diameter of 16.5mm, and a cylindrical discharge vessel (21) made of quartz glass with a total length of 2470mm. An electrode (22) is arranged in the center of the tube, and the Another semi-cylindrical electrode (23) is arranged on the outer surface of the capacitor (21). Moreover, excimer generation gas with a pressure of 60 kPa was sealed inside this discharge vessel (21), and the excimer lamp whose rated power consumption was 600 W was produced.

[0106] Use 4 excimer lamps (20) made in this way, install in figure 1 The structure of the excimer lamp device involved.

[0107] The gas supply piping provided adjacent to the excimer lamp (20) is made of aluminum, and nozzles consisting of small hole...

Embodiment 2

[0129] Set on the excimer lamp device used in the above-mentioned embodiment 1 Figure 4 , 5 The gas supply device shown thus constitutes the experimental setup. As the object to be processed, a substrate having the same structure as the substrate used in the above-mentioned Example 1 was used, and the absolute humidity (weight absolute humidity) in the inert gas was changed between 0 and 8.0 g / kg to perform cleaning, and the The contact angle of pure water on the substrate surface was measured. In addition, the driving conditions of the device are also the same as those in the above-mentioned embodiments.

[0130] Figure 10 The result of Example 2 is shown.

[0131] As the water vapor is increased from the weight absolute humidity of 0 g / kg, the contact angle of pure water on the substrate decreases, and the lowest contact angle is obtained around 3.0 to 3.5 g / kg. If the weight absolute humidity is greater than this, the contact angle will gradually increase, and if the...

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PUM

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Abstract

The present invention provides a quasi-molecular lamp device which is suitable for the maximization of the substrate and can reduce the running cost and does surface treating to the substrate practically. The quasi-molecular lamp device related by the invention is characterized in that the device comprises the following components: a lampshade for accommodating the quasi-molecular lamp; an air supplying tubing which is arranged in the lampshade and is located at the position parallel and interactive to the quasi-molecule lamp and is arranged with an air jetting outlet; and an air supplying unit which leads in the inert gas that contains vapor to the air supplying tubing, the inert gas with an absolute humidity controlled to the preset value is supplied to the air supplying tubing with theair supplying unit. Besides, the absolute humidity is converted to the weight absolute humidity between 0.5 to 6.5 g / kg.

Description

technical field [0001] The present invention relates to an excimer lamp device, which irradiates ultraviolet light on the surface of glass, semiconductor, resin, ceramic, metal, etc., such as liquid crystal panel substrate, semiconductor wafer, magnetic disk substrate, and optical disk substrate, and their composite substrates, thereby cleaning , Etching and other substrate processing. Background technique [0002] An excimer lamp device equipped with a known excimer lamp such as Patent Document 1, irradiates the surface of the object to be processed with ultraviolet light emitted from the excimer lamp in the range of 200 nm or less and 100 nm or more in an atmosphere where a trace amount of oxygen exists , through the enhanced effect of the generated active oxygen and the transmitted ultraviolet light, the organic matter on the surface of the object to be treated is decomposed and scattered, thereby cleaning. [0003] That is, the surface of the substrate is irradiated wit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F21S2/00H01L21/00F21W131/403
CPCB08B7/0057H01J65/04H01L21/67011
Inventor 菱沼宣是远藤真一
Owner USHIO DENKI KK
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