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Diamond-like material field electron emission cathode and manufacture method

A field electron emission and diamond technology, applied in cold cathode manufacturing, electrode system manufacturing, discharge tube/lamp manufacturing, etc., can solve the problems of limited increase in emission current and low space density of emitters

Inactive Publication Date: 2007-10-24
NANJING UNIV
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Problems solved by technology

The actual emission area and emission structure factor of the cathode are also very important factors. At present, a single C nanotube has been reported to have a very high emission structure factor (up to 10 4 above), but the spatial density of the emitter in the actual working cathode is not high, resulting in a limited increase in the overall emission current

Method used

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  • Diamond-like material field electron emission cathode and manufacture method
  • Diamond-like material field electron emission cathode and manufacture method

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Embodiment

[0013] Embodiment: Fig. 1 has provided the SEM photo of an actual BN working material / Si substrate cathode structure, we have confirmed that these sharp points are exactly the working emitter of this structure field emission from the measurement, after measuring the emitter areal density at 10 10 piece / cm 2 . The preparation conditions are as follows: Ar is fixed at 50 sccm to maintain a pressure of 150 Pa, He is adjusted between 10 sccm and 300 sccm to realize beam adjustment; the distance range of sputtering vapor drift from generation to extraction is adjusted to 10-12 cm. Adjust the size of the extracted beam to 5A / min~6A / min, and the deposition time is 100min.

[0014] Fig. 2 presents the results of field emission measurements of the structures described above. From which we can see that at a field strength of 4V / um, the sample starts to emit electrons in the F-N mode, and at an electric field strength of 6.2V / um, the emission current of the sample reaches 1mA / cm 2 , ...

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Abstract

The preparation method for field emission electron cathode made of quasi-diamond material comprises: with bluster beam current, depositing the high-density nano pinpoint emitter on substrate for high emission current and low emission threshold; in the high-vacuum chamber, impacting and RF magnetic-controlled sputtering with Ar and He gas to prepare nano particle, orienting the beam to the substrate, and changing the beam strength and deposition time to prepare the high-density emitter. The adjustment method for beam current comprises: adjusting the Ar and He gas in target chamber to 101-102sccm and 1:1-5:1 partial pressure ratio, adjusting the final size constituent of the working flow; adjusting the distance between the sputtering target material and the small hole more than 10cm, and adjusting the nano particle and the final emitter size.

Description

1. Technical field [0001] The invention relates to a high-performance field emission electron emission cathode and a preparation method, which utilizes the diamond-like material cluster beam deposition to realize a high spatial density emitter (10 9 -10 12 piece / cm 2 ) and a high-performance field electron emission cathode method, the core of which is to use cluster beams to deposit high-density nano-needle emitters on the substrate so as to achieve high field emission current and low emission threshold voltage. 2. Background technology [0002] Field electron emission is a process in which electrons inside a material are emitted to space through a suppressed material / vacuum interface barrier under the action of a strong electric field. This process has been widely used in field electron emission guns and field emission flat panel displays. Among them, the cathode is the core component that determines the performance of the field emission device. Th...

Claims

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Application Information

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IPC IPC(8): H01J1/304H01J29/04H01J9/02
Inventor 宋凤麒韩民张璐步海军周丰万建国周剑峰王广厚
Owner NANJING UNIV
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