Method and device for improving MCVD deposition efficiency and quality of low-temperature refrigeration

A technology of deposition efficiency and low-temperature gas, which is applied in glass deposition furnaces, manufacturing tools, glass manufacturing equipment, etc., can solve the problems of low deposition efficiency and loss, and achieve the effects of low refrigeration temperature, easy operation, and easy temperature measurement

Inactive Publication Date: 2007-09-26
BEIJING JIAOTONG UNIV
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Problems solved by technology

In addition, due to the small temperature gradient of the conventional MCVD method, when the gas flow is large, a large number of reaction product particles are not attached to the tube wall and are lost with the gas flow (7)
Also caused the deposition efficiency of this method to be low

Method used

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  • Method and device for improving MCVD deposition efficiency and quality of low-temperature refrigeration
  • Method and device for improving MCVD deposition efficiency and quality of low-temperature refrigeration
  • Method and device for improving MCVD deposition efficiency and quality of low-temperature refrigeration

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Embodiment Construction

[0028] The specific embodiment of the present invention will be described in detail below in conjunction with accompanying drawing 1-7:

[0029] The low-temperature blowing gas adopts high-purity inert gas, such as argon, nitrogen and helium, to avoid the influence on the heating area. Refrigerant gas (helium, argon or nitrogen) is output from a steel cylinder (or other gas source) through a pressure reducing valve to adjust the pressure and is controlled by a flowmeter. The gas temperature at this time is basically room temperature. The refrigerated gas output by the flowmeter is input into the low-temperature-resistant heat-conducting stainless steel pipe (12), and enters the heat-insulating container (10) filled with low-temperature cooling medium liquid nitrogen or other low-temperature substances (11) through the stainless steel pipe. In order to make the refrigerant gas fully cool down, the stainless steel pipe in the container is bent into a spiral (14) and submerged in t...

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Abstract

The invention discloses an increasing method of MCVD depositing efficiency and quality through low-temperature gas refrigerant and device, which comprises the following steps: proceeding low-temperature cool for refrigerant gas; leading the cool gas through jet blast cold device; decreasing temperature of depositing tube heat-reacting area during MCVD depositing course; changing adventitious deposit course of reaction product particle in the tube; increasing depositing efficiency; improving quality of outgrowth particle adhesive layer at the same time.

Description

[0001] Technical field: The present invention relates to the field of optical fiber communication, specifically a method and device for improving MCVD deposition efficiency and quality by cryogenic gas refrigeration. Background technique: [0002] At present, the preparation technologies of optical fiber preform mainly include modified chemical vapor deposition (MCVD), external vapor deposition (OVD), vapor axial deposition (VAD) and plasma chemical vapor deposition (PCVD). . Among these technologies, MCVD technology is widely used due to its advantages such as less environmental impact on deposition in a highly airtight tube, easy operation, and easy control of refractive index. Especially in the production of doped optical fibers, the wet doping process of using the MCVD process to make a loose layer and then soaking in a rare earth salt solution is widely used, and is currently the most important technical means for making doped optical fibers. However, the deposition effi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B37/018
CPCC03B2207/46C03B37/01815Y02P40/57
Inventor 魏淮郑凯毛向桥彭健李宏雷
Owner BEIJING JIAOTONG UNIV
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