Integrated complementary low voltage rf-ldmos
a low-voltage, integrated technology, applied in the direction of basic electric elements, electrical equipment, semiconductor devices, etc., can solve the problems of reliability problems, power loss in the device, and requiring a significantly larger chip area
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[0033]Turning now to the drawings, FIG. 1A is a diagrammatic view of an n channel integrated complementary low voltage RF-LDMOS transistor 10 according to an embodiment of the present invention. The transistor 10 has a source connection 12, a gate connection 14, and a drain connection 16. The gate connection 14 is electrically connected to a gate suicide 18 formed in a gate polysilicon 20. The gate polysilicon 20 has a stepped bottom layer lying over a split gate oxide 22 with a thin section 24 of length 26, and a thick section 28 of length 30. A sidewall oxide 32 is shown on the left side of the gate silicide 18, the gate polysilicon 20, and the thin section 24 of the split gate oxide 22. Similarly, a sidewall oxide 34 is shown on the right side of the gate polysilicon 20 and the thick section 28 of the split gate oxide 22.
[0034]The source connection 12 is electrically connected to a source silicide 36 under which is a source P+ tap 38. A shallow and short N+ source spacer 40 exten...
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