Stress engineering using dual pad nitride with selective SOI device architecture

Abstract

A method for engineering stress in the channels of MOS transistors of different conductivity using highly stressed nitride films in combination with selective semiconductor-on-insulator (SOI) device architecture is described. A method of using compressive and tensile nitride films in the shallow trench isolation (STI) process is described. High values of stress are achieved when the method is applied to a selective SOI architecture.

Description

FIELD OF THE INVENTION [0001] The present invention relates to semiconductor device manufacturing, and more particularly to a method for engineering stress in channel regions of metal-oxide-semiconductor (MOS) devices of different conductivities using highly stressed nitride films in combination with a selective semiconductor-on-insulator (SOI) device architecture. Specifically, the inventive method uses compressive and tensile nitride films as the dual pad nitride in a shallow trench isolation (STI) process to induce stress in the channel regions of MOS transistors. High values of stress are achieved when the inventive method is applied to a selective SOI device architecture. The present invention also relates to the semiconductor structure that is manufactured utilizing the method of the present application. BACKGROUND OF THE INVENTION [0002] Conventional gate length and gate dielectric scaling of complementary metal oxide semiconductor (CMOS) technology no longer produces the des...

AI Technical Summary

Benefits of technology

[0007] In accordance with the present invention, high values of stress can be introduced into the channel regions of MOS devices utilizing the method of the present invention in which dual stress nitride films are employed as a pad nitride film in the MOS isolation process (e.g., STI process) in conjunction with a selective SOI device architecture. Dual stress nitride liner means that both tensile and compressive nitride films are deposited on the wafer covering the desired device regions (i.e., nFET region or pFET region). The use of the highly stressed nitride films as the pad nitride film of the isolation process does not incorporate much strain in a conventional bulk silicon wafer, which is why the selective SOI architecture is important.

Problems solved by technology

Conventional gate length and gate dielectric scaling of complementary metal oxide semiconductor (CMOS) technology no longer produces the desired improvements in device performance.

Parasitic resistances and capacitances are becoming a fundamental limiting factor to improving device performance with each new technology node.

For example, the application of compressive stress in the longitudinal direction of current flow is beneficial for hole mobility, but detrimental for electron mobility.

The application of tensile stress in the longitudinal direction is beneficial for electrons, but detrimental for holes.

Unfortunately, the use of stress liners appears to be approaching limitations in the magnitude of stress that can be applied to the channel of CMOS devices.

Images